Closed-loop high-speed 3D thermal probe nanolithography

Knoll, Armin; Zientek, Michal; Cheong, Lin Lee; Rawlings, Colin; Paul, P.; Holzner, Felix; Hedrick, James L.; Coady, Daniel J.; Allen, Robert D.; Dürig, U.

doi:10.1117/12.2046201

Cited by 6 publications

(5 citation statements)

References 17 publications

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“…As another example, the low throughput of SPL is caused by the fact that a probe can only modify single nanoscale objects or molecules. Accelerating the SPL process would be only possible at the expense of a lower resolution (an exception is thermal SPL, in which high writing speeds, up to 20 mm s −1 at 15 nm resolution, can be obtained, making thermal SPL comparable with electron beam lithography in terms of throughput).…”

Section: Discussionmentioning

confidence: 99%

Nanostructure and Microstructure Fabrication: From Desired Properties to Suitable Processes

Assenbergh

Meinders²,

Geraedts

et al. 2018

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When designing a new nanostructure or microstructure, one can follow a processing-based manufacturing pathway, in which the structure properties are defined based on the processing capabilities of the fabrication method at hand. Alternatively, a performance-based pathway can be followed, where the envisioned performance is first defined, and then suitable fabrication methods are sought. To support the latter pathway, fabrication methods are here reviewed based on the geometric and material complexity, resolution, total size, geometric and material diversity, and throughput they can achieve, independently from processing capabilities. Ten groups of fabrication methods are identified and compared in terms of these seven moderators. The highest resolution is obtained with electron beam lithography, with feature sizes below 5 nm. The highest geometric complexity is attained with vat photopolymerization. For high throughput, parallel methods, such as photolithography (≈10 m h ), are needed. This review offers a decision-making tool for identifying which method to use for fabricating a structure with predefined properties.

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Section: Discussionmentioning

confidence: 99%

Nanostructure and Microstructure Fabrication: From Desired Properties to Suitable Processes

Assenbergh

Meinders²,

Geraedts

et al. 2018

Small

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show abstract

“…This integrated imaging provides instant information on the effectiveness of a patterning process and allows for real-time adjustment of the patterning parameters to better meet target criteria in a closed-loop lithography approach. [24,25] There are a few parameters that play a key role in successfully changing the properties of a material, and the temperature of the integrated heater is arguably the most important one. If it is too low, no modifications are induced in the material, if it is too high, the material can be damaged.…”

Section: Thermal Scanning Probe Lithographymentioning

confidence: 99%

“…This integrated imaging provides instant information on the effectiveness of a patterning process and allows for real‐time adjustment of the patterning parameters to better meet target criteria in a closed‐loop lithography approach. [ 24,25 ]…”

Section: Techniquesmentioning

confidence: 99%

Phase Nanoengineering via Thermal Scanning Probe Lithography and Direct Laser Writing

Levati

Girardi

Pellizzi

et al. 2023

Adv Materials Technologies

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Nanomaterials derive their electronic, magnetic, and optical properties from their specific nanostructure. In most cases, nanostructured materials and their properties are defined during the materials growth, and nanofabrication techniques, such as lithography, are employed subsequently for device fabrication. Herein, a perspective is presented on a different approach for creating nanomaterials and devices where, after growth, advanced nanofabrication techniques are used to directly nanostructure condensed matter systems, by inducing highly controlled, localized, and stable changes in the electronic, magnetic, or optical properties. Then, advantages, limitations, applications in materials science and technology are highlighted, and future perspectives are discussed.

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“…15,16 Scanning probe lithography can achieve sub-10 nm resolution, but this method is too slow for large area fabrication. [17][18][19][20] Nanopantography is a new patterning method for massively parallel writing of nanofeatures over large areas. Billions of electrostatic lenses are first fabricated on top of a wafer using conventional semiconductor manufacturing processes.…”

Section: Introductionmentioning

confidence: 99%

Transfer of nanopantography-defined patterns using highly selective plasma etching

Tian

Donnelly

Economou

2015

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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Nanopantography is a method for massively parallel patterning of nanofeatures over large areas. Transfer of patterns defined by nanopantography using highly selective plasma etching of Si, with the native silicon oxide as hard mask, can improve patterning speed and etch profile. With this method, arrays of high aspect ratio (>5) $10 nm-diameter holes, as well as slots, were fabricated in silicon with no mask undercut. The ability to fabricate complex patterns using nanopantography, followed by highly selective plasma etching, was also demonstrated. V

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Closed-loop high-speed 3D thermal probe nanolithography

Cited by 6 publications

References 17 publications

Nanostructure and Microstructure Fabrication: From Desired Properties to Suitable Processes

Nanostructure and Microstructure Fabrication: From Desired Properties to Suitable Processes

Phase Nanoengineering via Thermal Scanning Probe Lithography and Direct Laser Writing

Transfer of nanopantography-defined patterns using highly selective plasma etching

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