CMOS-compatible all-Si metasurface polarizing bandpass filters on 12-inch wafers

Xu, Zhengji; Dong, Yuan; Tseng, Chi-Che; Hu, Ting; Tong, Jianhua; Zhong, Qize; Li, Nanxi; Sim, L W; Lai, Keng Heng; Yang, Lin; Li, Dongdong; Liu, Yu; Bliznetsov, Vladimir; Fu, Yuan Hsing; Zhu, Shiyang; Lin, Qunying; Zhang, Dao Hua; Gu, Yuandong; Singh, Navab; Kwong, Dim‐Lee

doi:10.1364/oe.27.026060

Cited by 42 publications

(18 citation statements)

References 25 publications

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“…Lastly, the resist used here can also be exposed by UV-lithography. Advanced deep-UV-lithography systems routinely expose patterns significantly smaller than the patterns exposed by EBL here, and reports on macroscopic metasurfaces made by UV-lithography have indeed already appeared. − Considering this, one might envision a scheme where UV-lithography is used to build large-scale polymer-based metasurfaces, further decreasing the processing time and eventually facilitating flat optical components to become a substantial competitor to bulk optics.…”

Section: Discussionmentioning

confidence: 99%

Large-Scale Metasurfaces Made by an Exposed Resist

et al. 2020

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Phase-gradient metasurfaces have the potential to revolutionize photonics by offering ultrathin alternatives to a wide range of common optical elements, including bulky refractive optics, waveplates, and axicons. However, the fabrication of stateof-the-art metasurfaces typically involves several expensive, timeconsuming, and potentially hazardous processing steps. To address this limitation, a facile methodology to construct phase-gradient metasurfaces from an exposed standard electron beam resist is developed. The method dramatically cuts the required processing time and cost as well as reduces safety hazards. The advantages of the method are demonstrated by constructing high-performance flat optics based on the Pancharatnam-Berry phase gradient concept for the entire visible wavelength range. Manufactured devices include macroscopic (1 cm diameter) positive lenses, gratings exhibiting anomalous reflection, and cylindrical metalenses on flexible plastic substrates.

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Section: Discussionmentioning

confidence: 99%

Large-Scale Metasurfaces Made by an Exposed Resist

et al. 2020

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“…The primary materials used for dielectric metasurfaces include Si, GaN, TiO 2 , and SiN x . Si is an abundant element and can be easily processed using standard CMOS-compatible manufacturing techniques [117][118][119][120][121]. Therefore, Si-based metasurfaces are regarded as low-cost metasurface platforms.…”

Section: Si-based Metasurfacesmentioning

confidence: 99%

Review of Metasurfaces and Metadevices: Advantages of Different Materials and Fabrications

et al. 2022

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Flat optics, metasurfaces, metalenses, and related materials promise novel on-demand light modulation within ultrathin layers at wavelength scale, enabling a plethora of next-generation optical devices, also known as metadevices. Metadevices designed with different materials have been proposed and demonstrated for different applications, and the mass production of metadevices is necessary for metadevices to enter the consumer electronics market. However, metadevice manufacturing processes are mainly based on electron beam lithography, which exhibits low productivity and high costs for mass production. Therefore, processes compatible with standard complementary metal–oxide–semiconductor manufacturing techniques that feature high productivity, such as i-line stepper and nanoimprint lithography, have received considerable attention. This paper provides a review of current metasurfaces and metadevices with a focus on materials and manufacturing processes. We also provide an analysis of the relationship between the aspect ratio and efficiency of different materials.

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“…The device has also been patterned to form a color image of a rainbow lorikeet. Also, in the studies by Xu et al [115,116], the band pass filters have been patterned using 12-inch 193-nm deep UV immersion lithography followed by an inductive coupled plasma etching process. The filters work in both SWIR and visible wavelength range.…”

Section: Spectral Filters Integrated With Photodetector Array or Cmosmentioning

confidence: 99%

Spectral imaging and spectral LIDAR systems: moving toward compact nanophotonics-based sensing

Wang

et al. 2021

Nanophotonics

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With the emerging trend of big data and internet-of-things, sensors with compact size, low cost and robust performance are highly desirable. Spectral imaging and spectral LIDAR systems enable measurement of spectral and 3D information of the ambient environment. These systems have been widely applied in different areas including environmental monitoring, autonomous driving, biomedical imaging, biometric identification, archaeology and art conservation. In this review, modern applications of state-of-the-art spectral imaging and spectral LIDAR systems in the past decade have been summarized and presented. Furthermore, the progress in the development of compact spectral imaging and LIDAR sensing systems has also been reviewed. These systems are based on the nanophotonics technology. The most updated research works on subwavelength scale nanostructure-based functional devices for spectral imaging and optical frequency comb-based LIDAR sensing works have been reviewed. These compact systems will drive the translation of spectral imaging and LIDAR sensing from table-top toward portable solutions for consumer electronics applications. In addition, the future perspectives on nanophotonics-based spectral imaging and LIDAR sensing are also presented.

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CMOS-compatible all-Si metasurface polarizing bandpass filters on 12-inch wafers

Cited by 42 publications

References 25 publications

Large-Scale Metasurfaces Made by an Exposed Resist

Large-Scale Metasurfaces Made by an Exposed Resist

Review of Metasurfaces and Metadevices: Advantages of Different Materials and Fabrications

Spectral imaging and spectral LIDAR systems: moving toward compact nanophotonics-based sensing

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