2021
DOI: 10.1109/tie.2020.2984446
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CMOS MEMS Thermal Flow Sensor With Enhanced Sensitivity for Heating, Ventilation, and Air Conditioning Application

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Cited by 37 publications
(21 citation statements)
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“…In the earlier stage, the CMOS MEMS process had a larger CD or minimum line width in the academic labs of Europe and USA [73][74][75][76][77][78][79][80]. As the CD kept on decreasing to 0.8 µm [35] or even smaller than 0.6 µm [90,113] Fabrication technologies during CMOS and CMOS MEMS processes include thermal conversion [94,[141][142][143][144][145], chemical vapor deposition (CVD) [4,80,134], epitaxy [32,[146][147][148][149][150], physical vapor deposition (PVD) [151][152][153][154][155], atomic layer deposition (ALD) [156,157], spin-on films/dielectrics [158][159][160], bulk micromachining [161], surface micromachining [51,113,135,162], photolithography module [163], dry etching, and wet etching. Most of the materials used for structural, sacrificial and passivation layers include silicon and its oxide, nitride, silicon-germanium, carbide derivatives, and other notable semiconductor and dielectric materials [133,…”
Section: Educational Cmos Foundry Service Provided By Tsrimentioning
confidence: 99%
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“…In the earlier stage, the CMOS MEMS process had a larger CD or minimum line width in the academic labs of Europe and USA [73][74][75][76][77][78][79][80]. As the CD kept on decreasing to 0.8 µm [35] or even smaller than 0.6 µm [90,113] Fabrication technologies during CMOS and CMOS MEMS processes include thermal conversion [94,[141][142][143][144][145], chemical vapor deposition (CVD) [4,80,134], epitaxy [32,[146][147][148][149][150], physical vapor deposition (PVD) [151][152][153][154][155], atomic layer deposition (ALD) [156,157], spin-on films/dielectrics [158][159][160], bulk micromachining [161], surface micromachining [51,113,135,162], photolithography module [163], dry etching, and wet etching. Most of the materials used for structural, sacrificial and passivation layers include silicon and its oxide, nitride, silicon-germanium, carbide derivatives, and other notable semiconductor and dielectric materials [133,…”
Section: Educational Cmos Foundry Service Provided By Tsrimentioning
confidence: 99%
“…The amplifier was also added later to the sensor design. Numerous micromachined thermal flow sensors have been surveyed for different materials and applications including battery-free, wireless devices, nano mechanical sensor [171], infrared sensors [172][173][174][175][176], and calorimetric sensors [144,[177][178][179][180]. The high-quality CMOS foundry services provided by TSMC and UMC foundry were highly welcome over the past two decades.…”
Section: Cmos Mems Sensor Design Flowmentioning
confidence: 99%
“…Currently, as one of the important detection principles of MEMS sensors, thermal detection has been widely used in fluid sensing fields, especially in gas-related detection, such as gas flow [ 1 , 2 , 3 ], thermal conductivity [ 4 , 5 , 6 ], shear-stress [ 7 , 8 , 9 ], and vacuum [ 10 , 11 , 12 ], etc. Compared to normal chemical sensors, thermal MEMS sensors have the advantages of broad-spectrum, fast response, low power consumption, and long-term stability, becoming a major, long-standing research focus [ 13 , 14 , 15 ].…”
Section: Introductionmentioning
confidence: 99%
“…Microfabricated components have been integrated into microfluidic devices and implemented to develop more complex LOC devices for point-of-care testing. This integration enables the size reduction of essential equipment using integrated microfluidic components, such as electrokinetic actuators [3], micropumps [4], [5], electrical circuits [6]- [8], and analytical sensors [7]- [17].…”
Section: Introductionmentioning
confidence: 99%