CNx films created by combined laser deposition and r.f. discharge: XPS, FTIR and Raman analysis

Jelı́nek, M.; Zemek, J.; Vorlı́ček, V.; Lančok, J.; Tomov, Rumen I.; Šimečková, M.

doi:10.1016/s0040-6090(00)00853-1

Cited by 28 publications

(7 citation statements)

References 48 publications

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“…For melamine, the peaks at 3472, 3417, and 3325 cm −1 are attributed to stretching and deformation modes of -NH 2 groups. 39 These peaks gradually decreased when the preparation temperature increases, indicating the process of deamination. Meanwhile, the peak at 807 cm −1 , which corresponds to the breathing mode of the triazine ring, remains.…”

Section: Preparation and Characterization Of High-yield G-c 3 N 4 Pro...mentioning

confidence: 98%

High-yield synthesis and optical properties of g-C₃N₄

et al. 2015

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Graphitic carbon nitride (g-C3N4), a metal-free semiconductor with a band gap of 2.7 eV, has received considerable attention owing to its fascinating photocatalytic performances under visible-light. g-C3N4 exhibits high thermal and chemical stability and non-toxicity such that it has been considered as the most promising photocatalyst for environmental improvement and energy conservation. Hence, it is of great importance to obtain high-quality g-C3N4 and gain a clear understanding of its optical properties. Herein, we report a high-yield synthesis of g-C3N4 products via heating of high vacuum-sealed melamine powder in an ampoule at temperatures between 450 and 650 °C. Using transmission electron microscopy (TEM), scanning transmission electron microscopy (STEM), electron energy loss spectroscopy (EELS), thermogravimetric analysis (TGA), X-ray diffraction (XRD), and X-ray photoelectron spectroscopy (XPS), the chemical composition and crystallization of the as-produced g-C3N4 are demonstrated. A systematic optical study of g-C3N4 is carried out with several approaches. The optical phonon behavior of g-C3N4 is revealed by infrared and Raman spectroscopy, and the emission properties of g-C3N4 are investigated using photoluminescence (PL) spectroscopy, while the photocatalytic properties are explored by the photodegradation experiment.

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Section: Preparation and Characterization Of High-yield G-c 3 N 4 Pro...mentioning

confidence: 98%

High-yield synthesis and optical properties of g-C₃N₄

et al. 2015

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“…The high nitrogen content could be explained by the presence of such bonds between C and N which have been already evidenced in previous works. [36][37][38] Therefore, we can suggest that the most part of the carbon contained in the powders is free carbon, but there is a non-negligible amount of carbon linked to nitrogen. The band at 1600 cm −1 could also correspond to O H bonds, due to the presence of water adsorbed on the particles surface during their handling.…”

Section: Synthesis Of Powders Under Argon/ammoniamentioning

confidence: 98%

Synthesis under NH3 and thermal behaviour of SiCNAlO polymer-derived nanopowders

Salles¹,

Foucaud²,

Goursat³

et al. 2008

Journal of the European Ceramic Society

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“…This could additionally explain the presence of the 1,630 cm -1 peak. Furthermore, additional contributions to the 1,630 cm -1 peak could also appear due to the overlap with the C=C stretching vibration in the 1,610-1,650 cm -1 region [30]. The band assigned to Si-O stretching vibration that appears between 830 and 955 cm -1 corresponds to the strongly hydrogen-bonded Si-OH groups [31].…”

Section: Chemical and Functional Propertiesmentioning

confidence: 99%

Characterization of Plasma Polymerized Hexamethyldisiloxane Films Prepared by Arc Discharge

Lazauskas

Baltrušaitis

Grigaliūnas

et al. 2013

Plasma Chem Plasma Process

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Herein, we present a simple method for fabricating plasma polymerized hexamethyldisiloxane films (pp-HMDSO) possessing superhydrophobic characteristics via arc discharge. The pp-HMDSO films were deposited on a soda-lime-silica float glass using HMDSO monomer vapor as a precursor. A detailed surface characterization was performed using scanning electron microscopy and atomic force microscopy. The growth process of the pp-HMDSO films was investigated as a function of deposition time from 30 to 300 s. The non-wetting characteristics of the pp-HMDSO films were evaluated by means of contact angle (CA) measurements and correlated with the morphological characteristics, as obtained from microscopy measurements. The deposited films were found to be nanostructured and exhibited dual-scale roughness with the static CA values close to 170°. Fourier transform infrared spectroscopy analysis was carried out to investigate chemical and functional properties of these films. Methyl groups were identified spectroscopically to A.

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CNx films created by combined laser deposition and r.f. discharge: XPS, FTIR and Raman analysis

Cited by 28 publications

References 48 publications

High-yield synthesis and optical properties of g-C₃N₄

High-yield synthesis and optical properties of g-C₃N₄

Synthesis under NH3 and thermal behaviour of SiCNAlO polymer-derived nanopowders

Characterization of Plasma Polymerized Hexamethyldisiloxane Films Prepared by Arc Discharge

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CNx films created by combined laser deposition and r.f. discharge: XPS, FTIR and Raman analysis

Cited by 28 publications

References 48 publications

High-yield synthesis and optical properties of g-C3N4

High-yield synthesis and optical properties of g-C3N4

Synthesis under NH3 and thermal behaviour of SiCNAlO polymer-derived nanopowders

Characterization of Plasma Polymerized Hexamethyldisiloxane Films Prepared by Arc Discharge

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Product

Resources

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High-yield synthesis and optical properties of g-C₃N₄

High-yield synthesis and optical properties of g-C₃N₄