1999
DOI: 10.1016/s0168-9002(99)00274-0
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Co-axial multicusp source for low axial energy spread ion beam production

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Cited by 3 publications
(2 citation statements)
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“…Transverse magnetic filters such as the one employed in this source have been shown to be effective in modifying substantially the energy distribution of electrons in the extracted plasma. 4 Energetic electrons within the discharge chamber are prevented from crossing the magnetic field lines of the filter and following the ions exiting the discharge chamber (which themselves are largely unimpeded by the magnetic field). Low-energy electrons, however, are able to diffuse through the filter, and follow the ions, through momentum-exchange collisions with other electrons and with the other species within the source.…”
Section: A Magnetically-filtered Plasma Sourcementioning
confidence: 99%
“…Transverse magnetic filters such as the one employed in this source have been shown to be effective in modifying substantially the energy distribution of electrons in the extracted plasma. 4 Energetic electrons within the discharge chamber are prevented from crossing the magnetic field lines of the filter and following the ions exiting the discharge chamber (which themselves are largely unimpeded by the magnetic field). Low-energy electrons, however, are able to diffuse through the filter, and follow the ions, through momentum-exchange collisions with other electrons and with the other species within the source.…”
Section: A Magnetically-filtered Plasma Sourcementioning
confidence: 99%
“…Magnetic filter-equipped plasma sources that use multicusp magnetic field configurations may have applications as 3 Author to whom any correspondence should be addressed. ion sources in focused ion beam (FIB) lithography systems because they are capable of producing very low-energy-spread ion beams with correspondingly high emittance [8]. These plasma sources exhibit very low electron temperatures on the order of 0.1 eV in the region downstream of the magnetic filter and careful design of the filter layout and discharge chamber magnetic fields enables ion beams to be produced from plasma with ion energy spreads that are as low as 0.6 eV [8].…”
Section: Introductionmentioning
confidence: 99%