Co-development of stress and texture in reactive magnetron sputtered TiN films revealed by in situ film stress measurements

Machunze, R.; Tichelaar, F.D.; Janssen, G. C. A. M.

doi:10.1016/j.surfcoat.2010.09.021

Cited by 5 publications

(2 citation statements)

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“…Similarly high compressive stress values have been also previously reported in case of thinner films deposited by reactive route [42][43], which are observed to decrease with the thickness. This behavior has been reproduced here, with the deposition of an unbiased film on top of a biased one (sample Tb is the underlayer used in sample T).…”

Section: /19supporting

confidence: 85%

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Exploring the benefits of depositing hard TiN thin films by non-reactive magnetron sputtering

Martínez-Martínez¹,

López-Cartés²,

Fernández³

et al. 2013

Applied Surface Science

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The aim of this paper is to compare the mechanical and tribological properties of TiN coatings prepared in a conventional magnetron sputtering chamber according to two different routes: the usual reactive sputtering of a Ti target in an Ar/N 2 atmosphere vs. the comparatively more simple sputtering of a TiN target in a pure Ar atmosphere. Improved properties in term of hardness and wear rates were obtained for films prepared by non-reactive sputtering route, due to the lower presence of oxynitride species and larger crystalline domain size. Additionally, a significant hardness enhancement (up to 45 GPa) is obtained when a-100V d.c. bias is applied during growth. This behaviour is explained by non-columnar growth and small grain size induced by effective ion bombarding. These results demonstrate that non-reactive sputtering of TiN target appears a simple and efficient method to prepare hard wearresistant TiN films.

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Section: /19supporting

confidence: 85%

“…In fact, the stoichiometry of TiN samples is known to influence the mechanical properties of TiN films [37]. In addition, the overall amount of energy supplied to the growing film and the energy per incident particle influence film growth [23,43], which is favored in the absence of nitrogen in the gas phase.…”

Section: /19mentioning

confidence: 99%