2015
DOI: 10.1016/j.mssp.2014.07.023
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CO2 detection with CNx thin films deposited on porous silicon

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Cited by 15 publications
(5 citation statements)
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“…During the experiment the following were used: acetylcholinesterase (acetylcholine hydrolase, EC 3.1.1.7, acetylcholinesterase from human erythrocytes), acetylthiocholine iodide, 5,5 -dithio-bis(2-nitrobenzoic acid), neostigmine methyl sulfate and MgCl 2 , purchased from Sigma-Aldrich, NaCl (Daejung Chemical and Metals Co., Ltd), ethanol, water (Samchun Chemicals), HF (48 %, w/w; Merck) and boron-doped p-type silicon wafers with a resistivity of [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16][17][18][19][20] cm and thickness 500-550 μm (obtained from Cree Co.). The photoluminescence spectra and relative photoluminescence intensities were measured on an FS-2 fluorescence spectrometer (Scinco) and LabRam HR-800 spectrometer (Horiba Jobin Yvon) with a He/Cd laser source (325 nm).…”
Section: Materials and Instrumentationmentioning
confidence: 99%
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“…During the experiment the following were used: acetylcholinesterase (acetylcholine hydrolase, EC 3.1.1.7, acetylcholinesterase from human erythrocytes), acetylthiocholine iodide, 5,5 -dithio-bis(2-nitrobenzoic acid), neostigmine methyl sulfate and MgCl 2 , purchased from Sigma-Aldrich, NaCl (Daejung Chemical and Metals Co., Ltd), ethanol, water (Samchun Chemicals), HF (48 %, w/w; Merck) and boron-doped p-type silicon wafers with a resistivity of [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16][17][18][19][20] cm and thickness 500-550 μm (obtained from Cree Co.). The photoluminescence spectra and relative photoluminescence intensities were measured on an FS-2 fluorescence spectrometer (Scinco) and LabRam HR-800 spectrometer (Horiba Jobin Yvon) with a He/Cd laser source (325 nm).…”
Section: Materials and Instrumentationmentioning
confidence: 99%
“…The silicon wafer (boron-doped p-type silicon wafers with resistivity [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16][17][18][19][20] cm and thickness 500-550 μm) was cut into chips sized 1×1 cm 2 and degreased with an ultrasonic bath of acetone for 5 min, and then rinsed in deionized water. After drying with nitrogen gas, silver paste was simply sputtered on to the back of the wafer to provide a back ohmic contact for anodization.…”
Section: Preparation Of Porous Silicon Surfacementioning
confidence: 99%
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“…15) Carbon nitride is also studied as humidity sensors 16) and CO 2 sensors. 17) According to these reports, the adsorbed molecules can change mainly C-H bonds. On the other hand, we have prepared hydrogen-free a-CN x films by sputtering a graphite target in N 2 gas atmosphere and studied the resistivity change following the adsorption of N 2 .…”
Section: Introductionmentioning
confidence: 99%
“…In many workplaces recommendations are there, for indoor carbon dioxide concentrations not exceeding 1000-3000 ppm and consequently the development of CO 2 sensor is of outmost importance today [24][25][26]. In this present work, in order to improve the CO 2 sensing property of CdO nanostructure, CdO has been doped with tin (Sn).…”
Section: Introductionmentioning
confidence: 99%