Coatings for next generation lithography

Zaczek, Christoph; Müllender, S.; Enkisch, H.; Bijkerk, F.

doi:10.1117/12.796944

Cited by 13 publications

(8 citation statements)

References 0 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…To date, the shortest wavelength in semiconductor lithography mass production is 193 nm [2]. At this wavelength region only a few materials can be used for the coatings deposited on the components used in beam lines and laser systems due to their high optical absorption.…”

Section: Introductionmentioning

confidence: 99%

Effects of substrate temperatures and deposition rates on properties of aluminum fluoride thin films in deep-ultraviolet region

Sun

Zhang

et al. 2012

Appl. Opt.

View full text Add to dashboard Cite

Aluminum fluoride (AlF(3)) is a low-refractive-index material widely used in coatings for deep-ultraviolet (DUV) optical systems, especially 193 nm laser systems. Low optical loss and stability are essential for film application. In this study, AlF(3)> thin films were prepared by thermal evaporation with a resistive heating boat. The effects of substrate temperatures and deposition rates on the optical properties in vacuum and in air, composition, and microstructures were discussed respectively. In vacuum the deposition parameters directly influenced the microstructures that determined the refractive index. When the films were exposed to air, aluminum oxide (Al(2)O(3)) formed in the films with water adsorption. Thus the refractive index increased and a nonmonotonic changing trend of the refractive index with substrate temperature was observed. The Al(2)O(3) was also found to be conductive to reducing absorption loss. AlF(3) films prepared at a high substrate temperature and deposition rate could yield stable structures with large optical loss.

show abstract

Section: Introductionmentioning

confidence: 99%

Effects of substrate temperatures and deposition rates on properties of aluminum fluoride thin films in deep-ultraviolet region

Sun

Zhang

et al. 2012

Appl. Opt.

View full text Add to dashboard Cite

show abstract

“…Meanwhile, there are still some differences among these samples, when comparing their overall transmission spectrum on the wavelength region far from the design wavelength. This is due to their refractive index difference caused by the difference of incidence angle range of coating particles along the substrate axis [12], which is usually observed for coatings on strongly curved surface [8]. …”

Section: Resultsmentioning

confidence: 99%

Uniformity Masks Design Method Based on the Shadow Matrix for Coating Materials with Different Condensation Characteristics

Zhang

Cai

2013

The Scientific World Journal

View full text Add to dashboard Cite

An intuitionistic method is proposed to design shadow masks to achieve thickness profile control for evaporation coating processes. The proposed method is based on the concept of the shadow matrix, which is a matrix that contains coefficients that build quantitive relations between shape parameters of masks and shadow quantities of substrate directly. By using the shadow matrix, shape parameters of shadow masks could be derived simply by solving a matrix equation. Verification experiments were performed on a special case where coating materials have different condensation characteristics. By using the designed mask pair with complementary shapes, thickness uniformities of better than 98% are demonstrated for MgF2 (m = 1) and LaF3 (m = 0.5) simultaneously on a 280 mm diameter spherical substrate with the radius curvature of 200 mm.

show abstract

“…On the other hand, the microstructural and optical properties of the deposited thin film depend on the deposition angle of arrival molecules with respect to the substrate normal [15][16][17], as shown in Fig. On the other hand, the microstructural and optical properties of the deposited thin film depend on the deposition angle of arrival molecules with respect to the substrate normal [15][16][17], as shown in Fig.…”

Section: Theorymentioning

confidence: 98%

Optimization of thickness uniformity of optical coatings on a conical substrate in a planetary rotation system

et al. 2013

View full text Add to dashboard Cite

For a coating machine with a planetary rotation system and counterrotating shadowing mask configuration, a shadowing mask was designed using a numerical optimization algorithm to control the thickness uniformity of optical coatings formed on conical substrate. Single-layer magnesium fluoride (MgF(2)) and antireflective (AR) coating at 193 nm were fabricated on a convex conical substrate holder (with diameter 225 mm, apex angle 140 deg, and height 41 mm) by thermal evaporation. Thickness distribution determined from the transmittance spectra of single-layer MgF(2) thin films on BK7 slices showed that uniformities better than 99.3% were experimentally achieved with the designed counterrotating shadowing mask. From the reflectance spectra, uniform optical performance was also obtained for the 193 nm AR coating deposited on fused-silica substrates.

show abstract

Coatings for next generation lithography

Cited by 13 publications

References 0 publications

Effects of substrate temperatures and deposition rates on properties of aluminum fluoride thin films in deep-ultraviolet region

Effects of substrate temperatures and deposition rates on properties of aluminum fluoride thin films in deep-ultraviolet region

Uniformity Masks Design Method Based on the Shadow Matrix for Coating Materials with Different Condensation Characteristics

Optimization of thickness uniformity of optical coatings on a conical substrate in a planetary rotation system

Contact Info

Product

Resources

About