We study the effect of local modulation of charge density and carrier type in graphene field effect transistors using a double top gate geometry. The two top gates lead to the formation of multiple p-n junctions. Electron transport measurements at low temperature and in the presence of magnetic field show various integer and fractionally quantized conductance plateaus. We explain these results based on the mixing of the edge channels and find that inhomogeneity plays an important role in defining the exact quantization of these plateaus, an issue critical for the metrology applications of p-n junctions.The electronic properties of graphene have been studied extensively in recent years 1 , including effects like anomalous integer quantum Hall effect 2,3 . The advantage of controlling the charge type and electric field locally adds a new dimension to study electron transport 4 to see effects like Klein tunneling 5,6 , Andreev reflection 7 , collapse of Landau levels 8 , Veselago lens 9 and collimation of electrons with top gates 10 . The top gate geometry has been utilized in controlling the edge channels in the quantum Hall regime and with control over local and global carrier density. Such p-n 6,11 and p-n-p junctions 12 show integer and fractional quantized conductance plateaus. These integer and fractional quantized plateaus have been explained with the reflection and mixing of the edge channels leading to the partition of the current 13 . In this letter, we study electron transport in a graphene multiple lateral heterojunction device with charge density distribution of the type q-q 1 -q-q 2 -q with independent and complete control over both the charge carrier type and density in the three different regions. This is achieved by using a global back gate (BG) to fix the overall carrier type and density and local top gates (TG 1 , TG 2 ) to set the carrier type and density only below their overlap region with the graphene flake. By controlling the density under the two top gates, various conductance plateaus can be observed in quantum Hall regime. We explain these results by mixing and partitioning of the edge channels at the junctions. Our analysis on these two probe devices indicates that aspect ratio and inhomogeneity play an important role in determining the quantization of the conductance plateaus. The issues we explore here are also important in the use of multiple graphene p − n junctions for metrology 14 , use of graphene heterojunctions for collimation 10 and broad field of metamaterials based on graphene heterostructures 15 . The device fabrication starts with the mechanical exfoliation of graphene flakes from graphite 2,3 on 300 nm SiO 2 grown on degenerately doped silicon substrates. Using e-beam lithography, source-drain contacts were fabricated by depositing 10 nm/50 nm of Cr/Au. For the fabrication of top gates, we first spin coat 30 nm of NFC 1400 (JSR Micro) 16 as a buffer layer followed by the 10 nm of HfO 2 using atomic layer deposition to serve as the dielectric. Following this we fabricate ...