Emerging Lithographic Technologies VI 2002
DOI: 10.1117/12.472358
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Collinearity and stitching performance on an ASML stepper

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Cited by 7 publications
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“…Therefore, the lower bound for x is the length (L i ) of the inner beam and the upper bound is obtained by trial and error such that the minimum value of the objective function falls within two bounds. The constrained optimization problem presented in (11) is solved using M AT LAB. The results of DPCM after optimization of parasitic error are discussed in Section IV-C later.…”
Section: Subjectedtomentioning
confidence: 99%
See 1 more Smart Citation
“…Therefore, the lower bound for x is the length (L i ) of the inner beam and the upper bound is obtained by trial and error such that the minimum value of the objective function falls within two bounds. The constrained optimization problem presented in (11) is solved using M AT LAB. The results of DPCM after optimization of parasitic error are discussed in Section IV-C later.…”
Section: Subjectedtomentioning
confidence: 99%
“…Thus, compliant mechanisms provide backlash-free and frictionfree smooth motion with precision, accuracy, repeatability, and reliability for many nano and microscale applications [2]- [8]. These mechanisms are used in applications such as microstereolithography [9], spontaneous fabrication of the 3D multiscale fractal structures [10], and semiconductor wafer inspection/production instrumentation [11], Micro-Electro-Mechanical Systems (MEMS) [12], Scanning Probe Microscopy (SPM) [13].…”
Section: Introductionmentioning
confidence: 99%
“…The potential benefits of the planar parallel motion stages over serial manipulators are observed, such as lesser inertia parts, greater precision, larger workspace, and greater structural rigidity [9]. The above comparison outlines that parallel motion stages are more efficient than serial manipulators [10][11][12][13][14]. The most challenging aspect of micro-/nano manipulation is improving the design while considering numerous factors such as high stiffness, massive amplification, high-precision tracking [15], and accurate positioning.…”
Section: Introductionmentioning
confidence: 99%
“…However, there is now a growing need for XY nanopositioning systems that can provide motion range of several millimeters while maintaining nanometric quality in a compact desktop-size package. Such applications include scanning probe microscopy and metrology [11][12][13][14][15], scanning probe nanolithography [16,17], memory storage [18], harddrive [19] and semiconductor inspection [20], semiconductor packaging [21], and biological imaging [22].…”
Section: Introductionmentioning
confidence: 99%