2017
DOI: 10.1063/1.4995561
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Color mixing from monolithically integrated InGaN-based light-emitting diodes by local strain engineering

Abstract: Additive color mixing across the visible spectrum was demonstrated from an InGaN based light-emitting diode (LED) pixel comprising red, green, and blue subpixels monolithically integrated and enabled by local strain engineering. The device was fabricated using a top-down approach on a metal-organic chemical vapor deposition-grown sample consisting of a typical LED epitaxial stack. The three color subpixels were defined in a single lithographic step. The device was characterized for its electrical properties an… Show more

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Cited by 38 publications
(31 citation statements)
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“…The strain state of the In x Ga 1−x N QWs can cause a change in the bandgap energy E g and also of the internal piezoelectric field F. Indeed, strain relaxation at the mesa edges can cause a PL blue-shift of the In x Ga 1−x N QWs due to a reduction of the internal piezoelectric field. This last effect has been shown to have a significant impact for very small nanostructures: the PL emission of red-emitting In x Ga 1−x N QWs is shifted to green and blue when they are selectively etched to form nanowires with diameters of 150 and 50 nm, respectively 9 . In our work, the minimum mesa size is 10 µm and therefore a strong impact of strain variation on the In x Ga 1−x N bandgap and the piezoelectric field at the center of the mesas is not expected.…”
Section: Discussionmentioning
confidence: 99%
See 1 more Smart Citation
“…The strain state of the In x Ga 1−x N QWs can cause a change in the bandgap energy E g and also of the internal piezoelectric field F. Indeed, strain relaxation at the mesa edges can cause a PL blue-shift of the In x Ga 1−x N QWs due to a reduction of the internal piezoelectric field. This last effect has been shown to have a significant impact for very small nanostructures: the PL emission of red-emitting In x Ga 1−x N QWs is shifted to green and blue when they are selectively etched to form nanowires with diameters of 150 and 50 nm, respectively 9 . In our work, the minimum mesa size is 10 µm and therefore a strong impact of strain variation on the In x Ga 1−x N bandgap and the piezoelectric field at the center of the mesas is not expected.…”
Section: Discussionmentioning
confidence: 99%
“…Mixing the three basic blue/green/red colors directly on the same wafer is therefore highly desirable and constitutes an important challenge. Efforts towards this objective have been reported in the literature using for example nanowires grown by molecular beam epitaxy 5 , 6 , light conversion by (Ga,In)N multiple quantum wells 7 , facets with different orientations 8 , and local etching of red-emitting LED structures 9 .…”
Section: Introductionmentioning
confidence: 99%
“…In this way, the pixels can be fabricated on the wafer enabling a monolithic approach. Growing all three colors have been successful with site‐controlled growth where the confinement defines how much indium is incorporated . This monolithic approach has been used to produce nanowires structures .…”
Section: Challenges and Solutionsmentioning
confidence: 99%
“…Nevertheless, long-wavelength emission is difficult to achieve from GaInN/GaN multiple quantum well structures, owing to the degradation of crystalline quality and the large strain-induced piezoelectric field [17]. Recent studies have achieved different emission wavelengths from three-dimensional structures fabricated by local strain engineering [18][19][20]. Using the top-down etching method, the authors of reference [21] fabricated monolithic LEDs combining microstructure and nanostructures of GaInN/GaN, which emit distinctive blue-green-yellow light with a color rendering index (CRI) of 41.…”
Section: Introductionmentioning
confidence: 99%