This is an author produced version of a paper published in Solar Energy Materials and Solar Cells. This paper has been peer-reviewed but does not include the final publisher proof-corrections or journal pagination.
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AbstractElectrochromic films of tungsten oxide and nickel oxide were made by reactive dc magnetron sputtering and were characterized by X-ray diffraction, Rutherford backscattering spectrometry, scanning electron microscopy, and atomic force microscopy. The optical properties were investigated in detail by spectroscopic ellipsometry and spectrophotometry, using a multiple-sample approach. The W oxide film was modeled as a homogeneous isotropic layer, whereas the Ni oxide film was modeled as an anisotropic layer with the optical axis perpendicular to the surface. Parametric models of the two layers were then used to derive complex refractive index in the 300-1700-nm-range, film thickness, and surface roughness. A band gap of 3.15 eV was found for the W oxide film, using a Tauc-Lorentz parameterization. For the Ni oxide film, taken to have direct optical transitions, band gaps along the optical axis, perpendicular to it, and in an isotropic intermediate layer at the bottom of the film were found to be 3.95, 3.97, and 3.63 eV, respectively. Parameterization for the Ni oxide was made by use of the Lorentz model.