Combined nanoscale KPFM characterization and device simulation for the evaluation of the MOSFET variability related to metal gate workfunction fluctuations

Ruiz, A.; Seoane, Natalia; Claramunt, S.; García‐Loureiro, Antonio J.; Porti, M.; Nafría, M.

doi:10.1016/j.mee.2019.111048

Microelectronic Engineering

2019

DOI: 10.1016/j.mee.2019.111048

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Combined nanoscale KPFM characterization and device simulation for the evaluation of the MOSFET variability related to metal gate workfunction fluctuations

A. Ruiz

Natalia Seoane

S. Claramunt

et al.

Abstract: 2019) Combined nanoscale KPFM characterization and device simulation for the evaluation of the MOSFET variability related to metal gate workfunction fluctuations. Microelectronic Engineering,

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Combined nanoscale KPFM characterization and device simulation for the evaluation of the MOSFET variability related to metal gate workfunction fluctuations

Abstract: 2019) Combined nanoscale KPFM characterization and device simulation for the evaluation of the MOSFET variability related to metal gate workfunction fluctuations. Microelectronic Engineering,

Cited by 0 publications

References 21 publications

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