Combining theoretical description with experimental in situ studies on the effect of alkali additives on the structure and reactivity of vanadium oxide supported catalysts

Lewandowska, Anna E.; Calatayud, Mònica; Lozano-Diz, Enrique; Minot, Christian; Bañares, Miguel Á.

doi:10.1016/j.cattod.2008.04.049

Cited by 39 publications

(20 citation statements)

References 34 publications

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“…Particular attention has been focused on +4 and +5 oxidation states of vanadium oxide. Vanadium pentoxide (V 2 O 5 ) has applications as an electrode in lithium ion batteries, and as a catalyst‐support material . An interesting feature of vanadium dioxide (VO 2 ) is the well‐known semiconductor‐to‐metal phase transition that occurs close to 67°C and is accompanied by an abrupt change in its resistivity and near‐infrared transmission .…”

Section: Introductionmentioning

confidence: 99%

Atomic Layer Deposition of Groups 4 and 5 Transition Metal Oxide Thin Films: Focus on Heteroleptic Precursors

Blanquart

Niinistö

Ritala

et al. 2014

Chemical Vapor Deposition

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The atomic layer deposition (ALD) process, an alternative to CVD, is universally appreciated for its unique advantages such as excellent repeatability, conformity, and thickness control at the atomic level. ALD precursor chemistry has mainly been based on homoleptic compounds such as, but not limited to, metal halides, alkylamides, and alkoxides, however these precursors have drawbacks such as possible halide contamination and low thermal stabilities in the case of the alkylamides and alkoxides. Consequently, heteroleptic precursors have been investigated as alternatives to the existing homoleptic counterparts, leading to the development of several advantageous processes. Nevertheless, there is no thematic review dedicated to the heteroleptic precursors and their properties, and it seems that no coherent strategy has been adopted for the development of heteroleptic precursors. This review gives a brief description of ALD and presents studies on the deposition of thin films of groups 4 and 5 metal oxides using ALD. A description of the general ALD properties of homoleptic precursors, in addition to a review on the thermal ALD of groups 4 and 5 metal oxides from heteroleptic precursors, is provided. Trends in the properties of heteroleptic ALD precursors, based on the literature review and recent experimental data, are discussed.

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Section: Introductionmentioning

confidence: 99%

Atomic Layer Deposition of Groups 4 and 5 Transition Metal Oxide Thin Films: Focus on Heteroleptic Precursors

Blanquart

Niinistö

Ritala

et al. 2014

Chemical Vapor Deposition

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“…pore size distribution of supports or their fractality with reactivity [12,13]. Besides the VO x species, vanadia-support-interactions [14,15] or the influence of support-doping [16,17] should also be taken into account for targeted catalyst synthesis. With this in view, I. Wachs defined the activation of the bridging V-O-support bond as the kinetically relevant rate-determining step of oxidation reactions over supported VO x [18].…”

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confidence: 99%

Enhanced formaldehyde selectivity in catalytic methane oxidation by vanadia on Ti-doped SBA-15

et al. 2015

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“…These catalysts exhibit two key peaks located at 1015 cm −1 and 1627 cm −1 . The peak at 1015 cm −1 is attributed to the terminal vanadium oxy group (V 5+ =O) [49]. The peak at 1627 cm −1 is attributed to the Lewis acid sites [50].…”

Section: Ft-ir Analysismentioning

confidence: 99%

Influence of Sulfur-Containing Sodium Salt Poisoned V2O5–WO3/TiO2 Catalysts on SO2–SO3 Conversion and NO Removal

et al. 2018

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A series of poisoned catalysts with various forms and contents of sodium salts (Na2SO4 and Na2S2O7) were prepared using the wet impregnation method. The influence of sodium salts poisoned catalysts on SO2 oxidation and NO reduction was investigated. The chemical and physical features of the catalysts were characterized via NH3-temperature programmed desorption (NH3-TPD), H2-temperature programmed reduction (H2-TPR), X-ray photoelectron spectroscopy (XPS), Brunauer–Emmett–Teller (BET), X-ray diffraction (XRD), and Fourier Transform Infrared Spectroscopy (FT-IR). The results showed that sodium salts poisoned catalysts led to a decrease in the denitration efficiency. The 3.6% Na2SO4 poisoned catalyst was the most severely deactivated with denitration efficiency of only 50.97% at 350 °C. The introduction of SO42− and S2O72− created new Brønsted acid sites, which facilitated the adsorption of NH3 and NO reduction. The sodium salts poisoned catalysts significantly increased the conversion of SO2–SO3. 3.6%Na2S2O7 poisoned catalyst had the strongest effect on SO2 oxidation and the catalyst achieved a maximum SO2–SO3-conversion of 1.44% at 410 °C. Characterization results showed sodium salts poisoned catalysts consumed the active ingredient and lowered the V4+/V5+ ratio, which suppressed catalytic performance. However, they increased the content of chemically adsorbed oxygen and the strength of V5+=O bonds, which promoted SO2 oxidation.

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Combining theoretical description with experimental in situ studies on the effect of alkali additives on the structure and reactivity of vanadium oxide supported catalysts

Cited by 39 publications

References 34 publications

Atomic Layer Deposition of Groups 4 and 5 Transition Metal Oxide Thin Films: Focus on Heteroleptic Precursors

Atomic Layer Deposition of Groups 4 and 5 Transition Metal Oxide Thin Films: Focus on Heteroleptic Precursors

Enhanced formaldehyde selectivity in catalytic methane oxidation by vanadia on Ti-doped SBA-15

Influence of Sulfur-Containing Sodium Salt Poisoned V2O5–WO3/TiO2 Catalysts on SO2–SO3 Conversion and NO Removal

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