This note addresses the main challenges involved in monolithic micro-fabrication of large capacitive-MEMS-based reconfigurable electromagnetic apertures in antenna applications. The fabrication of a large DC bias line network, and also the metallic features in such apertures, requires special attention and optimization. It is shown that the choice of DC bias network material can impact DC and RF performance of the structure, and a trade-off between switching time and radiation pattern integrity should be considered.