Compact electron-based extreme ultraviolet source at 13.5 nm

Egbert, A.; Mader, B.; Tkachenko, Boris; Ostendorf, Andreas; Fallnich, Carsten; Chichkov, Boris N.; Miflalla, Thomas; Schuermann, Max Christian; Gaebel, Kai; Schriever, Guido; Stamm, Uwe

doi:10.1117/1.1532350

Cited by 23 publications

(17 citation statements)

References 3 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Today, with modified x-ray tubes it is possible to produce EUV radiation, too [31]. Also synchrotrons, initially intended as particle colliders, emit radiation in a broad spectral range (from hard x-rays to the IR).…”

Section: E U V a N D S O F T X -R Ay S O U R C E Smentioning

confidence: 99%

Radiation characteristics of extreme UV and soft X-ray sources

Mey¹

2015

Göttingen Series in X-Ray Physics

View full text Add to dashboard Cite

Section: E U V a N D S O F T X -R Ay S O U R C E Smentioning

confidence: 99%

Radiation characteristics of extreme UV and soft X-ray sources

Mey¹

2015

Göttingen Series in X-Ray Physics

View full text Add to dashboard Cite

“…At an accelerating voltage of 10 kV the conversion efficiency reaches a maximum value of 2.5×10 -4 [29]. This corresponds to an in-band EUV power per applied target current of 23 µW/mA.…”

Section: Spectral Properties Of the Euv Source And Output Powermentioning

confidence: 94%

Compact electron-based EUV and ultrashort hard x-ray sources

Egbert

Chichkov

2004

SPIE Proceedings

View full text Add to dashboard Cite

A review of our progress in the realization of an ultrashort-pulse laser-driven hard-x-ray source based on the combination of a femtosecond laser system with an x-ray diode is given. New results on the development of electronbased compact EUV sources for "at-wavelength" metrology are presented. Detailed investigations of spectral, spatial, and temporal characteristics of both sources are performed and possible applications are discussed.

show abstract

“…This efficiency is defined as the ratio of the number of generated EUV photons emitted at 13.5 nm (in 2% bandwidth and a solid angle of 2π sr) to the number of electrons. At an accelerating voltage of 10 kV the conversion efficiency reaches a maximum value of 2.5×10 -4 [2]. This value has been measured at an emission angle (take-off angle) of 45 degrees with respect to the target normal and corresponds to an in-band EUV power per applied target current of 23 µW/mA.…”

Section: Characteristics Of the Euv Tubementioning

confidence: 99%

“…Usually it is overlooked that one can produce EUV radiation directly from solid targets avoiding all these plasma-related drawbacks [2]. This can be done by using electron-induced characteristic emission from solids.…”

Section: Introductionmentioning

confidence: 99%

Debris-free low-cost commercial EUV source for at-wavelength metrology

Egbert¹,

Tkachenko²,

Becker³

et al. 2004

SPIE Proceedings

View full text Add to dashboard Cite

A commercial extreme ultraviolet (EUV) source for at-wavelength metrology is developed. The source concept is based on the transfer of advanced microfocus x-ray tube technology into the EUV spectral range. This concept allows the realization of a compact, debris-free, and long-term stable EUV source. In the EUV tube, silicon targets are used to generate radiation at 13.5 nm. Detailed characteristics of the source performance are reported and different applications of the source in the field of at-wavelength metrology are presented.

show abstract

Compact electron-based extreme ultraviolet source at 13.5 nm

Cited by 23 publications

References 3 publications

Radiation characteristics of extreme UV and soft X-ray sources

Radiation characteristics of extreme UV and soft X-ray sources

Compact electron-based EUV and ultrashort hard x-ray sources

Debris-free low-cost commercial EUV source for at-wavelength metrology

Contact Info

Product

Resources

About