Compact extreme ultraviolet source for laboratory-based photoemission spectromicroscopy

Schmitz, Christoph; Wilson, Daniel W.; Rudolf, Denis; Wiemann, C.; Pluciński, Ł.; Rieß, Sally; Schuck, Martin; Hardtdegen, H.; Schneider, Claus M.; Tautz, F. Stefan; Juschkin, Larissa

doi:10.1063/1.4953071

Cited by 11 publications

(9 citation statements)

References 23 publications

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“…The properties of the radiation depend on the generation process of the plasma. Spatially and temporally highly coherent and directed radiation [5][6][7] , as well as diffuse incoherent illumination [13][14][15] , can be achieved. Understanding and classifying the inherent effects occurring in this extreme kind of matter is, therefore, a crucial part of exploring the surrounding nature or enhancing technology.…”

mentioning

confidence: 99%

Nonlinear ionization dynamics of hot dense plasma observed in a laser-plasma amplifier

et al. 2020

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Understanding the behaviour of matter under conditions of extreme temperature, pressure, density and electromagnetic fields has profound effects on our understanding of cosmologic objects and the formation of the universe. Lacking direct access to such objects, our interpretation of observed data mainly relies on theoretical models. However, such models, which need to encompass nuclear physics, atomic physics and plasma physics over a huge dynamic range in the dimensions of energy and time, can only provide reliable information if we can benchmark them to experiments under well-defined laboratory conditions. Due to the plethora of effects occurring in this kind of highly excited matter, characterizing isolated dynamics or obtaining direct insight remains challenging. High-density plasmas are turbulent and opaque for radiation below the plasma frequency and allow only near-surface insight into ionization processes with visible wavelengths. Here, the output of a high-harmonic seeded laser-plasma amplifier using eight-fold ionized krypton as the gain medium operating at a 32.8 nm wavelength is ptychographically imaged. A complex-valued wavefront is observed in the extreme ultraviolet (XUV) beam with high resolution. Ab initio spatio-temporal Maxwell–Bloch simulations show excellent agreement with the experimental observations, revealing overionization of krypton in the plasma channel due to nonlinear laser-plasma interactions, successfully validating this four-dimensional multiscale model. This constitutes the first experimental observation of the laser ion abundance reshaping a laser-plasma amplifier. The presented approach shows the possibility of directly modelling light-plasma interactions in extreme conditions, such as those present during the early times of the universe, with direct experimental verification.

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confidence: 99%

Nonlinear ionization dynamics of hot dense plasma observed in a laser-plasma amplifier

et al. 2020

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“…In contrast to the measurements reported in Ref. [27], the energy resolution here is limited by the bandwidth of the ML-mirrors, resulting in the peak FWHM of 1.84 eV. Two materials fit to this range simultaneously-oxidized aluminum and copper.…”

Section: Cross-correlation With Photoemissionmentioning

confidence: 65%

“…gas discharge EUV source. 27 Instead of oxygen as the source fuel, a xenon/argon mixture 28 was used to achieve a higher photon energy. Compared to pure xenon, this mixture exhibits twice as many photons around 11 nm.…”

Section: Cross-correlation With Photoemissionmentioning

confidence: 99%

Spatially Resolved Spectroscopic Extreme Ultraviolet Reflectometry for Laboratory Applications

Tryus

Herbert

Wilson

et al. 2019

j nanosci nanotechnol

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Spatially resolved extreme ultraviolet reflectometry is presented in application to a local characterization of thin non-uniform contamination layers. Sample reflectivity mapping is performed, demonstrating high chemical sensitivity of the technique. Amorphous Al 2 O 3 and carbon are determined as the contaminants of the studied silicon wafer. The results correlate with those obtained by energy-filtering photoemission electron microscopy. A laboratory tool is developed that is capable of multi-angle (2-15) and spectrally broadband (9.5-17 nm) extreme ultraviolet reflectometry at grazing incidence combined with a reduced sample illumination spot size, enabling spatially resolved metrology. A minimum EUV spot size of 25 × 30 m in the sample plane is achieved experimentally.

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“…Initially designed for projection EUV lithography, EUV light from the discharge plasma is also used nowadays for metrology purposes, for example, reflectometry [5][6][7], scatterometry [8], photoemission electron microscopy [9], and magnetic polarization spectroscopy [4]. Furthermore, the current applications in nanostructuring using discharge EUV sources are focused on laboratorysize interference lithography [10] as well as resist and optics defectivity studies [11].…”

Section: Introductionmentioning

confidence: 99%

Ptychographic imaging with partially coherent plasma EUV sources

Bußmann

Odstrčil

Teramoto

et al. 2017

Advanced Optical Technologies

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We report on high-resolution lens-less imaging experiments based on ptychographic scanning coherent diffractive imaging (CDI) method employing compact plasma sources developed for extreme ultraviolet (EUV) lithography applications. Two kinds of discharge sources were used in our experiments: a hollow-cathode-triggered pinch plasma source operated with oxygen and for the first time a laser-assisted discharge EUV source with a liquid tin target. Ptychographic reconstructions of different samples were achieved by applying constraint relaxation to the algorithm. Our ptychography algorithms can handle low spatial coherence and broadband illumination as well as compensate for the residual background due to plasma radiation in the visible spectral range. Image resolution down to 100 nm is demonstrated even for sparse objects, and it is limited presently by the sample structure contrast and the available coherent photon flux. We could extract material properties by the reconstruction of the complex exit-wave field, gaining additional information compared to electron microscopy or CDI with longer-wavelength high harmonic laser sources. Our results show that compact plasma-based EUV light sources of only partial spatial and temporal coherence can be effectively used for lens-less imaging applications. The reported methods may be applied in combination with reflectometry and scatterometry for high-resolution EUV metrology.

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Compact extreme ultraviolet source for laboratory-based photoemission spectromicroscopy

Cited by 11 publications

References 23 publications

Nonlinear ionization dynamics of hot dense plasma observed in a laser-plasma amplifier

Nonlinear ionization dynamics of hot dense plasma observed in a laser-plasma amplifier

Spatially Resolved Spectroscopic Extreme Ultraviolet Reflectometry for Laboratory Applications

Ptychographic imaging with partially coherent plasma EUV sources

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