Comparative Study of Al-Induced Crystallization for Poly-Si and Ge on Insulating Film

Abstract

Al-induced crystallization (AIC) of Si and Ge has been comparatively investigated to realize poly-Si and poly-Ge layers on insulating films. For amorphous-Si (a-Si)/Al stacked structures, poly-Si oriented to the (111) direction was formed after annealing (450oC, 40h), and inversion of Si/Al layers occurred completely. On the other hand, poly-Ge with random orientations was formed in the local areas (diameter: 20 μm) of the Al layers after annealing (350oC, 150h) for a-Ge/Al stacked structures. In addition, inversion of Ge/Al layers did not occur. Understanding of AIC of Ge is necessary to establish a new technique for formation of high-quality poly-SiGe at low temperatures.