Comparative study of chromium nitride coatings deposited by unbalanced and balanced magnetron sputtering

Olaya, Jhon J; Rodil, S.E.; Mühl, S.

doi:10.1016/j.tsf.2004.08.067

Cited by 107 publications

(60 citation statements)

References 46 publications

Supporting

Mentioning

Contrasting

Unclassified

Order By: Relevance

“…Olaya et al [24] noted that the RF bias voltage influenced the crystal orientation and hardness of the deposits. Levy et al [25] studied the structural, mechanical, electronic and optical properties of transition metal nitrides (CrN, TiN, etc.)…”

Section: Introductionmentioning

confidence: 99%

Structural and mechanical characterisation of the chromium nitride hard coating deposited on the silicon and glass substrate

Shah¹

2017

Int. J. Automot. Mech. Eng.

View full text Add to dashboard Cite

Chromium Nitride (CrN) thin films are known for their comparatively good mechanical properties. CrN was deposited on Silicon (100) and glass substrates by using DC magnetron sputtering and the influence of the partial nitrogen content and different gaseous environment on their microstructural characteristics were investigated in the present work. The CrN films were characterised with X-Ray Diffraction (XRD), Field Emission Scanning Electron Microscopy (FE-SEM), Atomic Force Microscopy (AFM) and Nanoindentation was used to characterise the structural and mechanical properties of the deposited thin film. The films showed the [200] preferred orientation at lower (at 20%) nitrogen contents while the intensity of the peak [111] increases with the increase in the nitrogen content. The Cr2N (220) peak was identified at a nitrogen content above 30%, but for nitrogen content above 40%, the CrN phase was observed in both films deposited on Si(100) and glass substrates. The preferred orientations of the CrN thin films are strongly influenced by the nitrogen content inside the chamber as observed in the present work. The surface roughness and deposition rate were observed in a reducing trend with the increasing N2 content and temperature from 20.31 to 2.71nm and from 30.16 nm/min to 25.66nm/min, respectively. The hardness and modulus of pure N2 films deposited on the Si substrates were evaluated by nanoindentaion testing and indicated 31 GPa and 250 GPa, respectively.

show abstract

Section: Introductionmentioning

confidence: 99%

Structural and mechanical characterisation of the chromium nitride hard coating deposited on the silicon and glass substrate

Shah¹

2017

Int. J. Automot. Mech. Eng.

View full text Add to dashboard Cite

show abstract

“…Transition metal nitrides having bonds of a mixed nature of covalent, ionic and metallic character are of technological importance due to the combination of their functional properties that are associated with their unusual electronic bonding such as high hardness, high melting point and oxidation resistance (Olaya et al 2005). These coatings have found widespread use as hard wear protective coatings for cutting tools and wear applications, as diffusion barriers in micro electronic applications, and as corrosion and abrasion-wear resistant layers on optical and mechanical components (Deniel et al 2009).…”

Section: Introductionmentioning

confidence: 99%

Influence of nitrogen flow rates on materials properties of CrN x films grown by reactive magnetron sputtering

2012

View full text Add to dashboard Cite

“…[1][2][3][4][5][6][7][8][9][10] The research interests on fabricating CrN coatings and understanding the microstructure have been recently increased. [8][9][10] The CrN film exhibits micro-columnar growth on the substrate possessing a (100), (110), or (111) texture characteristic, which can be controlled by the growth conditions, film thickness, and the substrate material. 11 Such texture development during the growth has been observed and intensively discussed using X-ray diffraction and transmission electron microscopy (TEM).…”

Section: Introductionmentioning

confidence: 99%

Atomic and electronic structures of a transition layer at the CrN/Cr interface

Zhang¹,

Daniel²,

Mitterer³

2011

Journal of Applied Physics

View full text Add to dashboard Cite

Systematic structural and chemical characterization of the transition layer at the interface of NO-annealed 4H-SiC/SiO2 metal-oxide-semiconductor field-effect transistors By spherical aberration (C S )-corrected high-resolution transmission electron microscopy (HRTEM) and electron energy-loss spectroscopy (EELS), the atomic and electronic structures at the CrN/Cr interface are studied. A transition layer is formed at the CrN/Cr interface, which is identified as hexagonal Cr 2 N. The atomic structures at the interfaces are revealed. The elemental concentration distribution across the interface was quantified by EELS. The fine structures of Cr-L 2,3 in Cr, CrN, and Cr 2 N exhibit a subtle difference. The Cr-L 2,3 edge in CrN shows a noticeable chemical shift as compared to Cr and Cr 2 N, accompanied by a slight variation at the corresponding N-K edge.

show abstract

Comparative study of chromium nitride coatings deposited by unbalanced and balanced magnetron sputtering

Cited by 107 publications

References 46 publications

Structural and mechanical characterisation of the chromium nitride hard coating deposited on the silicon and glass substrate

Structural and mechanical characterisation of the chromium nitride hard coating deposited on the silicon and glass substrate

Influence of nitrogen flow rates on materials properties of CrN x films grown by reactive magnetron sputtering

Atomic and electronic structures of a transition layer at the CrN/Cr interface

Contact Info

Product

Resources

About