Graphene is an air-friendly material
that can be easily p-doped
by oxygen; therefore, a stable, defect-free, and efficient graphene
n-doping technique should be developed for achieving high performance
in electronic and optoelectronic devices. In this study, we present
a unique method for n-type chemical doping of monolayer graphene grown
through chemical vapor deposition. The doping process is thoroughly
examined using X-ray photoelectron spectroscopy, Raman spectroscopy,
and ultraviolet photoelectron spectroscopy. The findings demonstrate
that the use of KBr solution is highly effective in achieving n-type
doping in monolayer graphene, offering promising prospects for its
practical application. Also, we fabricated graphene field-effect transistors
and studied their electrical properties before (pristine) and after
doping the graphene channel with different KBr concentrations (0,
0.05, 0.15, 0.20, and 0.25 M) in dark and under deep-ultraviolet (DUV)
light conditions. During graphene doping in the dark environment,
the charge neutrality point (CNP) shifted toward negative back gate
voltages and then saturated at 0.25 M. After photochemical doping
under DUV light, CNP further shifted toward negative gate voltages
with improved carrier mobility at the same molar concentration of
0.25 M. Additionally, the photodetectors are fabricated from pristine
and doped graphene which demonstrated bipolar photoresponse, thereby,
a transition of negative photocurrent to a positive photocurrent when
the concentration of the KBr solution reached 0.20 M. Moreover, their
response time decreased from 8 to 3.5 s with increasing KBr concentration
from 0 to 0.30 M. Finally, the gate voltage-dependent broadband photoresponsivity
of doped graphene (0.25 M) was investigated at different wavelengths
(220, 365, 530, and 850 nm). Thus, the controlled doping-induced bidirectional
photoresponse can provide a facile route for logic gate applications.