Comparison between First- and Second-Generation Praseodymium Precursors for the MOCVD Synthesis of Praseodymium Aluminate Thin Films

Abstract

Praseodymium aluminum oxide (PrAlO x ) thin films have been grown by metal organic chemical vapor deposition (MOCVD) using two different multimetal sources consisting of mixtures of aluminum acetylacetonate (Al(acac) 3 ) with two praseodymium precursors, namely, the praseodymium hexafluoroacetylacetonate diglyme adduct (Pr(hfa) 3 ‚diglyme) and the praseodymium tetramethylheptanedionate (Pr(tmhd) 3 ). Smooth and amorphous films have been deposited on Si(100) substrates. Their chemical composition and microstructure, investigated by EDX measurements and TEM analyses, are deeply affected by the nature of the precursor mixture. Optimal structural and compositional properties are achieved with a Al(acac) 3 -Pr(hfa) 3 ‚diglyme mixture. Annealing procedures at 900 °C under an inert ambient atmospher do not affect the film crystallization. Preliminary electrical characterizations indicate a dielectric constant of about 12.

Metal–Organic Derivatives with Fluorinated Ligands as Precursors for Inorganic Nanomaterials

“…The authors described these multimetal liquid mixtures as “single sources” because it could be easily and cleanly evaporated with constant mass-transport rates and stoichiometric ratios. Thus, homogeneous and smooth films of LnAlO 3 (Ln = Y, , La, − Pr) were deposited on SrTiO 3 (100)/(110) or Si(100) substrates at temperature ranging from 900 to 1050 °C from a molten multicomponent source containing the [Ln­(hfac) 3 (diglyme)] (Ln = Y, La, Pr) and Al­(acac) 3 precursors. Films as thick as 600 nm could be fabricated upon tuning the deposition time.…”

Advances in Deposition of Main‐Group Metal Oxides and Rare‐Earth Oxides from Metal Enolates

“…Best results were obtained for the [Al(acac) 3 ]-[Pr(hfac) 3 (diglyme)] pair, which is low melting (77 ∘ C), and the complexes dissolve in each other, allowing easy evaporation from the melt, thus providing constant mass-transport rates. Annealing at 900 ∘ C under inert conditions did not affect crystallization of the film 108 as-deposited coatings are amorphous and of low roughness for >9.5% Eu, whereas for lower contents they are crystalline and rough. The amorphous films crystallized on annealing at 700 ∘ C. The as-obtained materials show luminescence with the highest intensity for amorphous phases produced by alternating Eu 2 O 3 and TiO 2 cycles 109 .…”