2022
DOI: 10.1016/j.jcis.2022.01.013
|View full text |Cite
|
Sign up to set email alerts
|

Comparison of activation behavior of Cs-O and Cs-NF3-adsorbed GaAs(1 0 0)-β2(2 × 4) surface: From DFT simulation to experiment

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2
1

Citation Types

1
11
0

Year Published

2022
2022
2024
2024

Publication Types

Select...
6

Relationship

1
5

Authors

Journals

citations
Cited by 15 publications
(12 citation statements)
references
References 36 publications
1
11
0
Order By: Relevance
“…This is due to the fact that an increase in Cs coverage enhances repulsive forces between Cs-adsorbed atoms, resulting in the activation system becoming increasingly unstable. This phenomenon is consistent with the adsorption energy trends of the Cs–NF 3 -adsorbed GaAs(100) – β 2 (2 × 4) surface from Li et al and the Cs/NF 3 coactivated In 0.53 Ga 0.47 As (001) surface from Fang et al with different Cs coverage. Furthermore, we can also find that the surface of Cs/NF 3 -activated Al 0.5 Ga 0.5 N thin films has lower adsorption energy than nanowire surface, which implies that Cs/NF 3 -activated thin films are more stable and their surface is more easily activated by Cs/NF 3 .…”
Section: Resultssupporting
confidence: 90%
See 4 more Smart Citations
“…This is due to the fact that an increase in Cs coverage enhances repulsive forces between Cs-adsorbed atoms, resulting in the activation system becoming increasingly unstable. This phenomenon is consistent with the adsorption energy trends of the Cs–NF 3 -adsorbed GaAs(100) – β 2 (2 × 4) surface from Li et al and the Cs/NF 3 coactivated In 0.53 Ga 0.47 As (001) surface from Fang et al with different Cs coverage. Furthermore, we can also find that the surface of Cs/NF 3 -activated Al 0.5 Ga 0.5 N thin films has lower adsorption energy than nanowire surface, which implies that Cs/NF 3 -activated thin films are more stable and their surface is more easily activated by Cs/NF 3 .…”
Section: Resultssupporting
confidence: 90%
“…Also, the amount of adsorbed O atom and NF 3 molecule is all one. O atom, NF 3 module, and Li atoms tend to be adsorbed between the Cs atoms and the surface. ,, The adsorption energy of Al 0.5 Ga 0.5 N after activation is calculated separately by Formulas – and is depicted in Figure . The results show that, for Al 0.5 Ga 0.5 N thin films, the Cs/NF 3 -activated surface is the most stable, while the least stable is the Cs/NF 3 /Li-activated surface.…”
Section: Resultsmentioning
confidence: 99%
See 3 more Smart Citations