2019
DOI: 10.1088/1361-6439/ab4d6f
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Comparison of Al and Cu masks used for patterning boron-doped diamonds in oxygen plasma

Abstract: In this paper we investigate the influence of different metallic (or metal-based) masking materials and plasma techniques for etching and patterning polycrystalline boron-doped diamond thin films. Lift-off technique was used to prepare various testing mask patterns with dimensions ranging from 1 μm to 15 μm. The results of plasma etching utilizing 100 nm Al and Cu masks are compared. Radio frequency and inductively coupled pure oxygen plasma techniques were used to obtain the fine etched structures. A simple e… Show more

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References 32 publications
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