2021
DOI: 10.1016/j.snb.2020.128980
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Comparison of Au-functionalized semiconductor metal oxides in sensitivity to VOC

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Cited by 39 publications
(32 citation statements)
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“…In the following sections, these relationships are reviewed based on our experimental studies of nanocrystalline n-type MOS: ZnO, In 2 O 3 , SnO 2 , BaSnO 3 , TiO 2 , WO 3 , Bi 2 WO 6 . The materials were synthesized via the standardized aqueous precipitation of metal hydroxides followed by calcination at temperature 300-700 • C [63,[74][75][76][77][78]. observation of actual reactivity of surface sites under in situ reaction conditions is an unresolved problem; and the above definition refers to a potential participation of certain types of active sites in real-life chemical reactions that determine the functionality of catalytic and sensing materials.…”
Section: Types Of Active Sites At the Mos Surfacementioning
confidence: 99%
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“…In the following sections, these relationships are reviewed based on our experimental studies of nanocrystalline n-type MOS: ZnO, In 2 O 3 , SnO 2 , BaSnO 3 , TiO 2 , WO 3 , Bi 2 WO 6 . The materials were synthesized via the standardized aqueous precipitation of metal hydroxides followed by calcination at temperature 300-700 • C [63,[74][75][76][77][78]. observation of actual reactivity of surface sites under in situ reaction conditions is an unresolved problem; and the above definition refers to a potential participation of certain types of active sites in real-life chemical reactions that determine the functionality of catalytic and sensing materials.…”
Section: Types Of Active Sites At the Mos Surfacementioning
confidence: 99%
“…In the following sections, these relationships are reviewed based on our experimental studies of nanocrystalline n-type MOS: ZnO, In2O3, SnO2, BaSnO3, TiO2, WO3, Bi2WO6. The materials were synthesized via the standardized aqueous precipitation of metal hydroxides followed by calcination at temperature 300-700 °C [63,[74][75][76][77][78]. ).…”
Section: Types Of Active Sites At the Mos Surfacementioning
confidence: 99%
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