2009
DOI: 10.1116/1.3097850
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Comparison of field-electron emission from different carbon nanotube array structures

Abstract: Field emission from diamond-coated multiwalled carbon nanotube "teepee" structures J. Appl. Phys. 112, 044903 (2012); 10.1063/1.4748336 Field-electron emission from flexible carbon nanotube array cathodesThe effect of macroscopic cathode structures, which consisted of an array of the identical vertically aligned carbon nanotube ͑VACNT͒ columns in a particular arrangement, on the field emission was investigated. The electric field simulation based on the FEMLAB code showed characteristics of edge-induced U-shap… Show more

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Cited by 21 publications
(10 citation statements)
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“…The growth of vertically-aligned CNT (VACNT) films was carried out using a hot-filament chemical vapor deposition (HFCVD) system which is equipped with a filament cartridge that accommodates four tungsten wires. 34,35) Substrates that were heavily-doped silicon wafers were thoroughly cleaned and coated with aluminum buffer and iron catalyst layers, which were deposited by sputtering in succession. The nominal thicknesses of aluminum and iron layers were controlled to 10 and 1.5 nm, respectively.…”
Section: Device Design and Fabricationmentioning
confidence: 99%
“…The growth of vertically-aligned CNT (VACNT) films was carried out using a hot-filament chemical vapor deposition (HFCVD) system which is equipped with a filament cartridge that accommodates four tungsten wires. 34,35) Substrates that were heavily-doped silicon wafers were thoroughly cleaned and coated with aluminum buffer and iron catalyst layers, which were deposited by sputtering in succession. The nominal thicknesses of aluminum and iron layers were controlled to 10 and 1.5 nm, respectively.…”
Section: Device Design and Fabricationmentioning
confidence: 99%
“…Then, bilayer catalysts of Al (10 nm) and Fe (1 nm) are deposited by sputtering, and CNT pillars are grown on them by hot-filament chemical vapor deposition (HFCVD) method with the substrate heated to 750 °C by the hot filament (³2000 °C). 33) The CNT pillar length controlled by the growth time is about 400 µm. The final step is to align and bond the three fabricated substrates.…”
Section: Device Design and Fabricationmentioning
confidence: 99%
“…The shape, dimensions, and layout of the columns are set on the basis of the previous research result. 19,20) The top substrate consists of an anode, a repel electrode, and two acceleration electrodes. The repel and the acceleration electrodes form a space for the ion flight path between the two substrates.…”
Section: Device Structure and Simulationmentioning
confidence: 99%