2011
DOI: 10.1002/pssc.201100282
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Comparison of InAs nanowire conductivity: influence of growth method and structure

Abstract: The conductivity and crystal structure of nominally undoped InAs nanowires deposited by three different methods – 1. selective area metal organic vapor phase epitaxy (SA MOVPE), 2. gold assisted vapor liquid solid (VLS) MOVPE and 3. extrinsic catalyst free VLS molecular beam epitaxy (MBE) – is investigated. The influence on conductivity by stacking faults and different growth conditions is analyzed to determine the main impact. It is found that in terms of crystal structure, nanowires deposited by VLS MOVPE an… Show more

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Cited by 10 publications
(7 citation statements)
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“…InAs nanowires were grown via gold-catalyzed metal–organic vapor phase epitaxy on GaAs (111)B substrates. The nanowires feature a zinc blende crystal structure with periodic rotational twinnings . In previous studies on similar nanowires field-effect mobilities were found to exceed 10 4 cm 2 /(V s) .…”
Section: Experimental Methodsmentioning
confidence: 80%
“…InAs nanowires were grown via gold-catalyzed metal–organic vapor phase epitaxy on GaAs (111)B substrates. The nanowires feature a zinc blende crystal structure with periodic rotational twinnings . In previous studies on similar nanowires field-effect mobilities were found to exceed 10 4 cm 2 /(V s) .…”
Section: Experimental Methodsmentioning
confidence: 80%
“…Device fabrication. InAs nanowires are grown via gold-catalysed metal-organic vapour phase epitaxy on GaAs (111)B substrates 28 . The field-effect mobility was found to be 25000 cm 2 /Vs 16 and the electron concentration is about 1.0 • 10 17 cm −319 .…”
Section: Methodsmentioning
confidence: 99%
“…The InAs nanowires are grown via gold-catalyzed metal–organic vapor phase epitaxy. , The nanowire with a diameter of 100 nm is mechanically transferred to a thermally oxidized Si substrate, which provides back-gate functionality in order to change the global Fermi level in the nanowire. A patch of high- k dielectric (LaLuO 3 ) is deposited onto the nanowire via pulsed laser deposition and liftoff technique.…”
Section: Experimental Methodsmentioning
confidence: 99%