Comparison of Indium-Tin-Oxide Transparent Conducting Films Fabricated By Spray CVD Using Different Tin Chlorides

Sawada, Yutaka; Kondo, Takeshi; Aoyama, Tatsuro; Ozao, Riko

doi:10.14723/tmrsj.34.225

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“…A few researchers have used SnCl 2 as a precursor to make ITO but they used indium chloride (InCl 3 ) as the indium precursor. 4,[18][19][20] The advantages of using an In(acac) 3 precursor is that it has direct metal-oxide bonding; another advantage is that it has rheological properties, so nanoimprinting can be done in the gel-state of In 2 O 3 and ITO films when fabricated with an In(acac) 3 precursor. 17) In this work, SnCl 2 and Sn(acac) 2 were selected.…”

Section: Introductionmentioning

confidence: 99%

Electrical properties of In₂O₃ and ITO thin films formed by solution process using In(acac)₃ precursors

Jain

Nakabayashi

Haga

et al. 2019

Jpn. J. Appl. Phys.

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Indium oxide (In2O3) and indium tin oxide (ITO) films were prepared by the solution process using an indium acetylacetonate [In(acac)3] precursor, and their electrical properties were also characterized. Rapid thermal annealing (RTA) of In2O3 and ITO precursor-gel films was performed in O2 by varying the annealing temperature and time. The obtained Hall mobility of In2O3 films is as high as 42.7 cm2 V−1 s−1, while resistivity as low as 2.5 × 10−3 Ωcm is obtained for 1 wt% ITO with a Hall mobility and a carrier concentration of 24.1 cm2 V−1 s−1 and 1.0 × 1020 cm−3, respectively. The ITO was prepared using two different Sn precursors—one was SnCl2 and the other was Sn(acac)2—to compare its electrical properties—and it was found that the Hall mobility was higher in the ITO prepared using Sn(acac)2 as the Sn precursor. Using the solution-processed In2O3 as a channel, a thin film transistor was also fabricated and n-channel transistor operation was confirmed.

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Section: Introductionmentioning

confidence: 99%

Electrical properties of In₂O₃ and ITO thin films formed by solution process using In(acac)₃ precursors

Jain

Nakabayashi

Haga

et al. 2019

Jpn. J. Appl. Phys.

View full text Add to dashboard Cite

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Comparison of Indium-Tin-Oxide Transparent Conducting Films Fabricated By Spray CVD Using Different Tin Chlorides

Cited by 1 publication

References 9 publications

Electrical properties of In₂O₃ and ITO thin films formed by solution process using In(acac)₃ precursors

Electrical properties of In₂O₃ and ITO thin films formed by solution process using In(acac)₃ precursors

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Comparison of Indium-Tin-Oxide Transparent Conducting Films Fabricated By Spray CVD Using Different Tin Chlorides

Cited by 1 publication

References 9 publications

Electrical properties of In2O3 and ITO thin films formed by solution process using In(acac)3 precursors

Electrical properties of In2O3 and ITO thin films formed by solution process using In(acac)3 precursors

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Electrical properties of In₂O₃ and ITO thin films formed by solution process using In(acac)₃ precursors

Electrical properties of In₂O₃ and ITO thin films formed by solution process using In(acac)₃ precursors