Comparison of material measures for areal surface topography measuring instrument calibration

Abstract

The calibration of areal surface topography measuring instruments is a topic that is currently under discussion in international standard committees and a specification standard that defines the so-called ‘metrological characteristics’ has been published. For the broad industrial adoption of the metrological characteristics for calibration, however, clear and easy-to-apply calibration guidelines are required. Thus, a single-sample calibration artefact has been developed which allows the determination of the standardised metrological characteristics. In order to promote the adoption of the metrological characteristics calibration framework, measurements of the material measures with different instruments have been conducted and the results are presented. We report early work on the uncertainty of the comparison results and discuss systematic deviations between the various surface topography measuring instruments.

Precision of diamond turning sinusoidal structures as measurement standards used to assess topography fidelity

“…At the Physikalisch-Technische Bundesanstalt (PTB), the German National Metrology Institute, such a traceably calibrated instrumental setup has been developed [27][28][29]. It is used for research and for calibration services [30].…”

Characterization of surface texture-measuring optical microscopes using a binary pseudo-random array standard

“…2 Standardized areal reference artifacts, or material measures, suitable for the characterization of topography microscopes (see ISO 25178-70 3 ) are now becoming commercially available. [4][5][6] Existing standards offer ways to estimate the resolution of topography microscopes or even map the instrument transfer function. An example are the areal measures with star-shape grooves (ASG) described in ISO 25178-70.…”

Traceability of 3D optical measuring instruments in industrial environments using customized material standards

“…This artifact is capable of providing the entire set of relevant metrological characteristics in the same sample. In addition, it has been used two-photon laser lithography (direct laser writing, DLW) for the manufacturing process [180,181].…”

“…Figure 115 PTB Cu depth setting standard [178] Figure 116 Universal calibration artifact [180,181] The specimen has different parts [180,181]:…”

“…Currently, there are several modern technologies such as silicon micro-technologies, lithography, focused ion beam, direct laser writing and other AM technologies that may help metrology industry on manufacturing new standards, as demonstrated in [180,181].…”