“…Since the discovery of the phenomenon of dense plasma focus in the 1960s by the scientists Mather and Fillipov [1,2] and their design of two types of dense plasma focus devices were known by their names, a large number of researches and studies have been conducted that have dealt with this unique phenomenon from various aspects such as plasma focus dynamics, particle emission, and X-ray emission. The study of the dynamics of the plasma focus covered the formation and acceleration of the plasma layer inside the device [3] and the factors affecting such as the sheath current [4], pinch current [5], length of the insulator used to separate the anode and the cathode, the type of gas used within the device [6,7], the parameters of the capacitor bank [8] and electrode engineering, and ion beam properties produced in dense plasma focus devices using various gases [9]. Due to the collapse of the plasma pinch after a short period of time (several ns) of its formation and emitting ions and electrons in opposite directions, many studies have been conducted that dealt with the possibility of benefiting from the emitted particle beams such as lithography [10,11] and short-lived radioisotope produc-tion [12][13][14][15] thin film deposition [16,17].…”