2008
DOI: 10.1088/0963-0252/17/3/035026
|View full text |Cite
|
Sign up to set email alerts
|

Comparison of plasma parameters determined with a Langmuir probe and with a retarding field energy analyzer

Abstract: A comparison is made between plasma parameters measured with a retarding field energy analyzer (RFEA), mounted at a grounded electrode in an inductive discharge, and a Langmuir probe located in bulk plasma close to the analyzer. Good agreement between measured plasma parameters is obtained for argon gas pressure in the range 2-10 mTorr. Parameters compared include time averaged plasma potential, the tail of the electron energy distribution function (EEDF), the electron temperature and the ion flux. This highli… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
2

Citation Types

3
44
0

Year Published

2009
2009
2025
2025

Publication Types

Select...
7

Relationship

0
7

Authors

Journals

citations
Cited by 57 publications
(47 citation statements)
references
References 37 publications
3
44
0
Order By: Relevance
“…The derivative was found by applying a 151 point, 4 degree SavitzkyGolay filter [37] to the collector current. This derivative should be proportional to the EEDF for energies high enough to enter the probe [24]. In this case the plasma potential was around 40 V, so that the electron energies in the plasma would be about 40 eV higher than what the discriminator voltage shows.…”
Section: Methodsmentioning
confidence: 99%
See 3 more Smart Citations
“…The derivative was found by applying a 151 point, 4 degree SavitzkyGolay filter [37] to the collector current. This derivative should be proportional to the EEDF for energies high enough to enter the probe [24]. In this case the plasma potential was around 40 V, so that the electron energies in the plasma would be about 40 eV higher than what the discriminator voltage shows.…”
Section: Methodsmentioning
confidence: 99%
“…D is the discriminator grid and was scanned from 0 to −120 V, R is the repeller grid biased at +100 V and C is the collector kept at +9 V. The innermost grid was not needed in this configuration and was therefore grounded. This grid configuration with the discriminator in front of the repeller is similar to the one used by Gahan et al [24,30]. Only the electrons with energies high enough to overcome the sheath potential in front of the probe will be recorded, so that the RFEA detects only the high-energy tail of the EEDF [30].…”
Section: Methodsmentioning
confidence: 99%
See 2 more Smart Citations
“…26,27 Used in parallel with film deposition, plasma diagnostics ensure process control and reproducibility of the process. Optical emission spectroscopy ͑OES͒, 28,29 quadrupole mass spectrometry ͑QMS͒, 30,31 and diagnostics by means of a retarding field energy analyzer ͑RFEA͒ 32 and a Langmuir probe [33][34][35] are the most common plasma characterization techniques. The last of these provides reliable monitoring of plasma parameters by means of recording I-V characteristics from an electrostatic tip in the glow discharge.…”
Section: Introductionmentioning
confidence: 99%