1990
DOI: 10.1143/jjap.29.l712
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Comparison of Silica- and Alumina-Based Spin-on Sources for P-Contact Diffusion of Zinc into InGaAs

Abstract: Alumina- and silica- based spin-on sources for p+-doping of InGaAs contact layers are compared. Shallow diffusion profiles with hole concentrations up to 2×1020/cm3 were obtained. Higher doping levels and improved long-term stability of the spin-on solution were achieved with the alumina-based source.

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