Comparison of some coating techniques to fabricate barrier layers on packaging materials

Hirvikorpi, Terhi; Vähä-Nissi, Mika; Harlin, Ali; Karppinen, Maarit

doi:10.1016/j.tsf.2010.04.018

Cited by 79 publications

(41 citation statements)

References 21 publications

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“…Atomic layer deposition is the fabrication method of choice, since very thin but 3D surface coatings are possible with that technique. [ 111 ] In the following, we give some examples of structures produced out of biocompatible photoresist. Although there are many biocompatible photosensitive materials, that are used for µ-printing, [ 19,33,[112][113][114] we want to exemplarily discuss structures, in which two different photoresists are combined or which consist of hollow or fl exible components.…”

Section: Progress Reportmentioning

confidence: 99%

Three‐Dimensional μ‐Printing: An Enabling Technology

Hohmann

Renner

Waller

et al. 2015

Advanced Optical Materials

155

102

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functional elements, chiral photonic crystals, photonic metamaterials and quasicrystals. With this technology becoming commercially available, [ 1 ] many novel ideas have been realized by scientists around the world. Some of these developments can already be seen as new research areas enabled by 3D µ-printing.Many excellent reviews of the underlying technology have recently been published, and we give here just a short selection. [2][3][4][5] With the present progress report we want to summarize the tremendous technological development during the last fi ve years as well as to give an overview over some vastly growing research fi elds enabled by this development. As the number of research papers based on 3D µ-printing as enabling technology is exploding, we intend to categorize the most recent developments to identify future research directions and possible novel fi elds for the years to come. Recent Technological Advances in 3D µ-PrintingFrom the fi rst proof-of-principle in 1997, [ 6 ] the µ-printing community has continuously been expanding the structuring capabilities of µ-printing systems overcoming limitations such as structuring speed, sample volume, complicated pre and post processing, as well as minimum feature size and resolution. Progress is made along two directions: First, extending the aforementioned benchmarks of µ-printing systems. Second, techniques that move µ-printed structures towards functional devices. These two directions obviously are intertwined and require interdisciplinary research efforts on new photocurable materials, complex light-matter interaction, reaction kinetics as well as processes on a molecular level infl uencing structure formation. The most infl uential technological advances are summarized in this section.Section 2.1. covers recent work leading to a tremendous increase of the capabilities of µ-printing systems. Section 2.2. describes superresolution concepts exploiting light-matter interactions to achieve smaller feature sizes and higher structural resolution. Section 2.3. reviews spatial light modulator (SLM) based laser lithography providing additional degrees of freedom by shaping the wavefront of the laser beam. Laser Sources, Scanning Devices, and Writing GeometryThe high complexity of ultrafast fs-lasers drives the community to look for alternative laser sources, leading to cost and In this progress report the development of three-dimensional µ-printing and its impact as an enabling technology onto different scientifi c fi elds is reviewed. Driven by direct laser writing via two-photon absorption, the technology has reached a level of maturity and ease of application such that 3D printing on the micrometer scale can now be considered. While the underlying technology is still developing towards higher resolution and increasing speed of fabrication, the last fi ve years have seen new fi elds rising that were obviously enabled by 3D µ-printing. Among the recent technological developments discussed in this progress report are the fi elds of super-resolution lithography ...

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Section: Progress Reportmentioning

confidence: 99%

Three‐Dimensional μ‐Printing: An Enabling Technology

Hohmann

Renner

Waller

et al. 2015

Advanced Optical Materials

155

102

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“…AlMe 3 and H 2 O were used as precursors. The ALD process parameters were selected according to our previous investigations on low-temperature ALD process for temperature-sensitive substrates [9,19,20]. Two different processing temperatures (70 ºC and 100 ºC) and three different ALD cycles (10, 50 and 100) were used to deposit the ALD coatings on the TFC PA membranes.…”

Section: Ald Coatingsmentioning

confidence: 99%

“…The nominal thicknesses of the coating was estimated based on the growth rate 0.1 nm/cycle measured from films grown on a silicon wafer with a Nanospec AFT 4150 reflectometer [19,20]. ALD coatings have shown a minor variation of the actual film thickness, because of the difference in surface chemistry and roughness of different polymers, in comparison to a silicon wafer.…”

Section: Ald Coatingsmentioning

confidence: 99%

Surface modification of thin film composite polyamide membrane using atomic layer deposition method

Nikkola

Sievänen

Raulio

et al. 2014

Journal of Membrane Science

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“…The atomic layer deposition (ALD) technique has been found to be very effective compared with some other coating techniques. [7] Thin aluminum oxide and silicon dioxide coatings have been deposited on packaging materials to achieve excellent barrier properties to water and oxygen. [8,9] Laminates are made by compounding layers of high barrier property with other layers of low cost and other desirable properties.…”

Section: Introductionmentioning

confidence: 99%

Improving the Barrier Properties of Poly(Lactic Acid) by Blending with Poly(Ethylene-Co-Vinyl Alcohol)

Gui

Zhang

et al. 2012

Journal of Macromolecular Science, Part B

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Poly(lactic acid) (PLA)/poly(ethylene-co-vinyl alcohol) (EVOH) blends were prepared via melt blending to improve the barrier properties of PLA. The phase morphologies and final properties (rheological behavior, thermal and dynamical-mechanical features, barrier properties, and mechanical behaviors) of the blends were investigated as a function of the EVOH content. The results indicated that hydroxyl groups of EVOH promoted the degradation of PLA, and thus affected the viscosities and morphologies of the resulting blends. The intrinsic viscosities of PLA in the blends decreased with the content of EVOH. The PLA and EVOH presented typical phase-separated morphologies,with a relatively small domain size of the EVOH phase. The EVOH enhanced the coldcrystallization behavior of PLA. The barrier properties to water vapor and oxygen increased linearly with increasing EVOH content.

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Comparison of some coating techniques to fabricate barrier layers on packaging materials

Cited by 79 publications

References 21 publications

Three‐Dimensional μ‐Printing: An Enabling Technology

Three‐Dimensional μ‐Printing: An Enabling Technology

Surface modification of thin film composite polyamide membrane using atomic layer deposition method

Improving the Barrier Properties of Poly(Lactic Acid) by Blending with Poly(Ethylene-Co-Vinyl Alcohol)

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