Speedam 2010 2010
DOI: 10.1109/speedam.2010.5542035
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Comparison of trench gate IGBT and CIGBT devices for 3.3kV high power module applications

Abstract: Trench gate MOS controlled devices are more desirable in power modules because their reduced Vce(sat) enables increased output power density. However with increased drift region thickness with voltage rating, there is significant increase in conduction loss in Trench gate IGBT (T-IGBT) due to low plasma density from inherent pnp transistor action. On the other hand a well-designed trench gate MOS-controlled thyristor such as the Trench Cluster Insulated Gate Bipolar Transistor (T-CIGBT) is a drop in solution, … Show more

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“…Then, operating with Eq. ( 14) and ( 16), and defining X 0 as (17), expression (18) can be obtained.…”
Section: B Topology Analysismentioning
confidence: 99%
“…Then, operating with Eq. ( 14) and ( 16), and defining X 0 as (17), expression (18) can be obtained.…”
Section: B Topology Analysismentioning
confidence: 99%
“…In an effort to overcome downsides of conventional planar gate IGBT technologies, such as negative temperature coefficient of Punch-Through (PT) and increased conduction losses, due to the thicker substrate of Non-Punch Through (NPT) devices, trench gate technology has been developed [20], [21]. Reduced diameter of the gate provides enhancement of charge injection, reduced tail current at turn off, as well as reduced conduction and switching losses [22], [23]. Since the voltage drop over the channel is inversly proportional to the channel width and proportional to the length of the channel, lower conduction losses were achived by shortening the channel [24].…”
Section: Introductionmentioning
confidence: 99%