Nonvolatile memories have emerged in recent years and have become a leading candidate towards replacing dynamic and static random-access memory devices. In this article, the performances of TiO 2 and TaO 2 nonvolatile memristive devices were compared and the factors that make TaO 2 memristive devices better than TiO 2 memristive devices were studied. TaO 2 memristive devices have shown better endurance performances (10 8 times more switching cycles) and faster switching speed (5 times) than TiO 2 memristive devices. Electroforming of TaO 2 memristive devices requires 4.5 times less energy than TiO 2 memristive devices of a similar size. The retention period of TaO 2 memristive devices is expected to exceed 10 years with sufficient experimental evidence. In addition to comparing device performances, this article also explains the differences in physical device structure, switching mechanism, and resistance switching performances of TiO 2 and TaO 2 memristive devices. This article summarizes the reasons that give TaO 2 memristive devices the advantage over TiO 2 memristive devices, in terms of electroformation, switching speed, and endurance.