2022
DOI: 10.1039/d2sm00486k
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Complete stress release in monolayer ALD-Al2O3 films based on mechanical equilibrium homeostasis to realize a bending radius of 1 mm

Abstract: Low-temperature-deposited, transparent, high-barrier-performance atomic layer deposition(ALD) Al2O3 films are widely utilized to protect organic optoelectronic devices. However, because the internal compression residual stresses result in poor mechanical properties, these films...

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Cited by 4 publications
(4 citation statements)
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“…Furthermore, many efforts to enhance flexibility use organic buffer layer. The organic layer not only delays the travel time of water molecules between pinholes or defects in the upper and lower inorganic layers but also compensates for film stress (σ r ), thereby enhancing the barrier property and bendability [40,71,72]. Organic layer typically includes CVD films, spin-coating polymers, MLD thin films, and inkjet printing monomers [42,[71][72][73].…”
Section: Bendable Multilayer Structuresmentioning
confidence: 99%
See 1 more Smart Citation
“…Furthermore, many efforts to enhance flexibility use organic buffer layer. The organic layer not only delays the travel time of water molecules between pinholes or defects in the upper and lower inorganic layers but also compensates for film stress (σ r ), thereby enhancing the barrier property and bendability [40,71,72]. Organic layer typically includes CVD films, spin-coating polymers, MLD thin films, and inkjet printing monomers [42,[71][72][73].…”
Section: Bendable Multilayer Structuresmentioning
confidence: 99%
“…Modulating process conditions such as temperature, pulse time, pressure, and the choice of precursor species can achieve the desired filling. Moreover, ALD allows for deposition at low temperatures, a crucial requirement for encapsulating flexible electronics [40]. Importantly, in the ALD process, the uniform thin film chemically binds to the surface on the substrate, ensuring strong bonding and conformal contact between layers, ideal for interface stabilization.…”
Section: Introductionmentioning
confidence: 99%
“…Single-layer TFE and multilayer TFE are the most common types of TFE, and a wide range of inorganic and organic materials have been utilized in TFE [8][9][10][11] . Organic materials such as AlOx, SiOx, SnOx, SiN, and TiO2 are regularly employed in single-layer film [12][13][14] . Although single-layer TFE is a simple technique with low production costs, barrier performance is restricted.…”
Section: Introductionmentioning
confidence: 99%
“…High-performance, low-power, and small-size semiconductor devices have been intensively studied in the last decades to overcome the physical limitations of the existing system and boost computing efficiency [1][2][3] . To implement electronic products based on these emerging devices in the near future, various components that can support the devices should be developed together; for example, compact electronic devices require multi-functional materials that are lightweight and flexible but can protect them from external shocks, while quickly dissipating heat generated from the device [4][5][6][7] . A composite is a mixture of the structure and characteristics of two or more materials, and in general, the physical and chemical properties of the basic matrix can be enhanced by additive reinforcements 8 .…”
mentioning
confidence: 99%