“…[3][4][5] Recently, we developed an alternative route toward the patterning of III-V semiconductor heterostructures based on a defect-engineering approach exploiting the hydrogen-induced passivation of N atoms in Ga(AsN) [ 6 ] , (InGa)(AsN), [ 7 ] and Ga(PN) [ 8 ] crystals. Indeed, H atoms form stable N-2H-H complexes [ 9 , 10 ] that wipe out the N effects in the lattice, thus modifying in a controllable manner the electronic (e.g., bandgap energy, [6][7][8] transport, [ 11 ] and spin properties [ 12 ] ), optical (refractive index [ 13 ] ), and structural (lattice constant [ 6 , 14 ] and ordering [ 15 ] ) characteristics of these materials. [ 16 ] Therefore, by allowing H incorporation in selected regions of the sample, it is possible to achieve a spatially tailored modulation of the bandgap energy [ 17 ] as well as of the lattice constant [ 18 ] in the growth plane.…”