Compressive stress induced formation of cubic boron nitride

McKenzie, David R.; McFall, W. D.; Sainty, Wayne G.; Davis, C. A.; Collins, R.E.

doi:10.1016/0925-9635(93)90260-9

Cited by 263 publications

(68 citation statements)

References 11 publications

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“…Such a method will preferentially detect the stiff component of the material. It is well known from many investigations that BN films deposited by various methods form a complex morphology with crystallites embedded in an amorphous matrix [35][36][37][38]. Especially if the material is subjected to an intense ion bombardment during the growing process it tends to form crystallites on the nanometer scale.…”

Section: Resultsmentioning

confidence: 99%

Elastic properties of thin h-BN films investigated by Brillouin light scattering

et al. 1999

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Hexagonal BN films have been deposited by rf-magnetron sputtering with simultaneous ion plating. The elastic properties of the films grown on silicon substrates under identical coating conditions have been determined by Brillouin light scattering from thermally excited surface phonons. Four of the five independent elastic constants of the deposited material are found to be c 11 = 65 GPa, c 13 = 7 GPa, c 33 = 92 GPa and c 44 = 53 GPa exhibiting an elastic anisotropy c 11 /c 33 of 0.7. The Young´s modulus determined with load indentation is distinctly larger than the corresponding value taken from Brillouin light scattering. This discrepancy is attributed to the specific morphology of the material with nanocrystallites embedded in an amorphous matrix.

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Section: Resultsmentioning

confidence: 99%

Elastic properties of thin h-BN films investigated by Brillouin light scattering

et al. 1999

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“…high voltage, bias sputtering or ion beam bombardment at the substrate. [20][21][22][23] Mechanisms proposed for cBN stabilization in BN films include both preferential sputtering effects [24] , the presence of large stresses [25][26] and subplantation [27][28] wherein low energy ions are implanted below the surface to increase local density. Post deposition treatments of hBN are also revealing, as 180 keV N 2 + (i.e.…”

Section: Discussionmentioning

confidence: 99%

Nanohardness and chemical bonding of boron nitride films

Jankowski

1999

Thin Solid Films

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“…high voltage, bias sputtering or ion beam bombardment at the substrate. [18][19][20][21] Mechanisms proposed for cBN stabilization in BN films include both preferential sputtering effects [22] , the presence of large stresses [23][24] and subplantation [25][26] wherein low energy ions are implanted below the surface to increase local density. Post deposition treatments of hBN are also revealing, as 180 keV N 2 + ion implantation at a 10 mA cm -2 current density induced a significant proportion of sp 3 bonding characteristic of cBN.…”

Section: Discussionmentioning

confidence: 99%

Nitrogen Implantation Effects on the Chemical Bonding and Hardness of Boron and Boron Nitride Coatings

et al. 1998

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February 8, 1999This is a preprint of a paper intended for publication in a journal or proceedings. Since changes may be made before publication, this preprint is made available with the understanding that it will not be cited or reproduced without the permission of the author. PREPRINT NITROGEN IMPLANTATION EFFECTS ON THE CHEMICAL BONDING AND HARDNESS OF BORON AND BORON NITRIDE COATINGSAlan Jankowski*, Thomas Felter*, Robert Patterson*, Jeffrey Hayes*, Simone Anders**, Thomas Stamler**, and David Poker*** *Lawrence Livermore National Laboratory, 7000 East Avenue, Livermore, CA 94550 **Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, CA 94720 ***Oak Ridge National Laboratory, 1 Bethel Valley Road , Oak Ridge, TN 37831 ABSTRACTBoron nitride (BN) coatings are deposited by the reactive sputtering of fully dense, boron (B) targets utilizing an argon-nitrogen (Ar-N 2 ) reactive gas mixture. Near-edge x-ray absorption fine structure analysis reveals features of chemical bonding in the B 1s photoabsorption spectrum. Hardness is measured at the film surface using nanoindentation. The BN coatings prepared at low, sputter gas pressure with substrate heating are found to have bonding characteristic of a defected hexagonal phase. The coatings are subjected to post-deposition nitrogen (N + and N 2 + ) implantation at different energies and current densities. The changes in film hardness attributed to the implantation can be correlated to changes observed in the B 1s NEXAFS spectra.

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Compressive stress induced formation of cubic boron nitride

Cited by 263 publications

References 11 publications

Elastic properties of thin h-BN films investigated by Brillouin light scattering

Elastic properties of thin h-BN films investigated by Brillouin light scattering

Nanohardness and chemical bonding of boron nitride films

Nitrogen Implantation Effects on the Chemical Bonding and Hardness of Boron and Boron Nitride Coatings

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