2008
DOI: 10.1063/1.3041659
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Computation of dust charge and potential on a static spherical dust grain immersed in rf discharges

Abstract: Dust charge and potential on static spherical dust grains located in an argon rf discharge under typical laboratory experiment conditions have been computed using a three-dimensional ParticleParticle-Particle-Mesh (P 3 M ) code. Elastic and inelastic collisions have been included in the current model to obtain realistic rf discharge plasma conditions. Dust charge, potential and potential distribution around the dust have been computed for various sizes of dust placed at different locations in the rf discharge.… Show more

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Cited by 18 publications
(11 citation statements)
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“…Note that a similar tendency in the behavior of the particle charge has been revealed in numerical simulations. 18 Continuing now with the sheath electric field, its local value E 0 = m 0 g / q 0 is found to be E 0 =26 V/ cm at pressure p = 30 Pa, E 0 =38 V/ cm at p = 55 Pa, and E 0 =45 V/ cm at FIG. 5.…”
Section: Resultsmentioning
confidence: 90%
“…Note that a similar tendency in the behavior of the particle charge has been revealed in numerical simulations. 18 Continuing now with the sheath electric field, its local value E 0 = m 0 g / q 0 is found to be E 0 =26 V/ cm at pressure p = 30 Pa, E 0 =38 V/ cm at p = 55 Pa, and E 0 =45 V/ cm at FIG. 5.…”
Section: Resultsmentioning
confidence: 90%
“…The largest flux ratios of electrons to ions have been found close to the presheath in such plasmas [35]. As a result, the magnitude of the fluctuation reduces about an order of magnitude from the case in [34] to Fig.…”
Section: A Dust Chargingmentioning
confidence: 85%
“…SCEPTIC [15], COPTIC [21], a hybrid P 3 M-code [37] and DiP3D [16] use three-dimensional grids to simulate the plasma dynamics around dust grains with realistic grain properties (i.e. Powerful tools for this purpose are Molecular Dynamics (MD) simulations and Particle-In-Cell (PIC) methods.…”
Section: Wake Fields In Theory Simulation and Experimentsmentioning
confidence: 99%