2006
DOI: 10.1016/j.tsf.2006.03.052
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Computational fluid dynamic modeling of tin oxide deposition in an impinging chemical vapor deposition reactor

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Cited by 22 publications
(11 citation statements)
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“…In short, the deposition profile changes from M shape with two maximum layer thicknesses, each one side of the gas inlet, to A shape with one maximum underneath the gas inlet. Such changes in shape of the deposition profile cannot be explained by layer formation directly from the source gasses, in contrast to the more widely described the case of SnO 2 deposition where a more or less peak shaped deposition profile is observed [25]. However, the shift of deposition maxima towards the gas inlet with temperature can be explained by a mechanism in which an intermediate product is formed first, where-after it reacts further on the surface, thereby depositing the ZnO layer.…”
Section: Resultsmentioning
confidence: 59%
See 1 more Smart Citation
“…In short, the deposition profile changes from M shape with two maximum layer thicknesses, each one side of the gas inlet, to A shape with one maximum underneath the gas inlet. Such changes in shape of the deposition profile cannot be explained by layer formation directly from the source gasses, in contrast to the more widely described the case of SnO 2 deposition where a more or less peak shaped deposition profile is observed [25]. However, the shift of deposition maxima towards the gas inlet with temperature can be explained by a mechanism in which an intermediate product is formed first, where-after it reacts further on the surface, thereby depositing the ZnO layer.…”
Section: Resultsmentioning
confidence: 59%
“…In order to design an effective reactor for ZnO deposition, more accurate information on the mechanism was needed. Moreover, it was previously demonstrated that modeling can be a powerful tool for understanding what actually happens inside a reactor [25]. For the APCVD process of SnO 2 deposition, a good modeling fit was obtained with a surface reaction between the oxidizing agent and the precursor [26].…”
Section: Introductionmentioning
confidence: 99%
“…The initial motivations of these studies are to predict the convective heat and mass transfer in related applications, [7][8][9][10][11] such as electronics packing, 12 chemical vapour deposition reactor, 13 cell adhesion measurements, 14,15 and industry clearing processes. 16 Moreover, there are some other applications, such as circular aerostatic thrust bearings, 17 polymer processing, 18 and flames in microcombustors. 19 In previous studies, much research attention was paid on the effects of inlet nozzle Reynolds number (Re) and aspect ratios of discs distance-to-nozzle radius (e = h/R in ) on the vortices structures in the flow field, [20][21][22][23] which affect the radial flow behaviours and applications significantly.…”
Section: Introductionmentioning
confidence: 99%
“…However, they are not many papers dealing with the characterization of the shear stress distribution at the lower wall of the RFC (Fryer et al, 1985;DiMilla, 1997, 1998;Jensen and Friis, 2004;Moller, 1963) as many of them are concerned with heat transfer or mass transfer applications (e.g. use of impinging jets as coolant, CVD deposition) (Li et al, 2006;Park et al, 2003).…”
Section: Introductionmentioning
confidence: 99%