2019 IEEE International Electron Devices Meeting (IEDM) 2019
DOI: 10.1109/iedm19573.2019.8993578
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Computational Study of Spin Injection in 2D Materials

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Cited by 3 publications
(13 citation statements)
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“…While insulators can offer one such tunneling medium, the lack of precise control over the barrier thickness and the presence of pinhole defects can lead to large device-to-device variability, or low attained ζ s , respectively. Interestingly, 2D-M with the presence of vdW gap along their out-of-plane direction for top-contacts to select metals (Figure 4d) (absence of d-orbitals) can exhibit enhanced spin-injection efficiencies (Figure 4e), [16] thereby lowering device-to-device variability, and offering a distinct advantage over (bulk-) 3D-materials. However, while practically achieving sole top-contacts with pristine interfaces remains difficult, experimental demonstrations with insulating oxides-TiO 2 [65,66] (Figure 4f), SrO, [67] and Al 2 O 3 [68] The presence of a vdW gap along the out-of-plane direction for the top-contact configuration presents an additional TB that increases injected spin-polarization, as seen in (e), where transmission spectrum as a function of energy has been plotted for two contacts.…”
Section: Spin Injectionmentioning
confidence: 99%
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“…While insulators can offer one such tunneling medium, the lack of precise control over the barrier thickness and the presence of pinhole defects can lead to large device-to-device variability, or low attained ζ s , respectively. Interestingly, 2D-M with the presence of vdW gap along their out-of-plane direction for top-contacts to select metals (Figure 4d) (absence of d-orbitals) can exhibit enhanced spin-injection efficiencies (Figure 4e), [16] thereby lowering device-to-device variability, and offering a distinct advantage over (bulk-) 3D-materials. However, while practically achieving sole top-contacts with pristine interfaces remains difficult, experimental demonstrations with insulating oxides-TiO 2 [65,66] (Figure 4f), SrO, [67] and Al 2 O 3 [68] The presence of a vdW gap along the out-of-plane direction for the top-contact configuration presents an additional TB that increases injected spin-polarization, as seen in (e), where transmission spectrum as a function of energy has been plotted for two contacts.…”
Section: Spin Injectionmentioning
confidence: 99%
“…Furthermore, the relatively small spin-Hall angle (SHA) of ≈0.1, defined as the ratio of the generated spin-current to the incident chargecurrent, in conventional heavy metals (with a large SOC) like Ta, Pt, [167] limits the maximum achievable energy-efficiency of conventional SOT-MRAMs. This can be also be resolved by the use of low-resistive highly doped 2D-M and its compounds, [16] f) Experimentally reported TMR (blue), and resistance (red) for a Co-h-BN-Fe MTJ at 1.4 K. [182] d,e) Reproduced with permission. [16] Copyright 2019, IEEE.…”
Section: Spin-based Memoriesmentioning
confidence: 99%
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“…Metal-semiconductor contacts in nature tend to form Schottky barriers (SBs) with rectifying behavior [19]. Although our knowledge of engineering TMD-metal contacts for both charge [20][21][22][23][24] and spin [21,25,26] has undeniably progressed, contact resistance of today's conventional contacts to 2D semiconductors still exceeds that of their CMOS counterparts by at least an order of magnitude [27]. In conventional semiconductor technologies, Schottky contacts are engineered to become ohmic by strong doping of the semiconductor surface [28].…”
Section: Introductionmentioning
confidence: 99%