2014
DOI: 10.1116/1.4897138
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Computational study of the demolding process in nanoimprint lithography

Abstract: The demolding process in nanoimprint lithography is studied using molecular dynamics simulations. The difference in the mold separation behaviors between molecular dynamics and continuous mechanics simulations is shown, and the effect that the molecular size of the polymer resist has upon the demolding force is explained from the perspective of the molecular behavior. Depending upon the correlation between the type of resist molecule and the mold cavity size, the demolding force originates from the molecular f… Show more

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Cited by 14 publications
(13 citation statements)
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“…The inner force-time curves indicate the inner behaviors during the separation process that is used in the previous reports to analyze the interfacial joining properties [ 36 , 37 ]. Figure 11 shows the interaction energies of polymer-metal hybrid structure and inner forces in PP layer during the separation process with different substrates.…”
Section: Resultsmentioning
confidence: 99%
“…The inner force-time curves indicate the inner behaviors during the separation process that is used in the previous reports to analyze the interfacial joining properties [ 36 , 37 ]. Figure 11 shows the interaction energies of polymer-metal hybrid structure and inner forces in PP layer during the separation process with different substrates.…”
Section: Resultsmentioning
confidence: 99%
“…In the stochastic simulations of the UV-curing process, the motion of the UV-cured polymers cannot be traced. Therefore, we performed MD simulations developed for thermal nanoimprint lithography (T-NIL) to analyze the de-molding process [7][8][9]. Because the force field for the UV-cured resist is not known, we investigated the de-molding process of the poly(methyl methacrylate) (PMMA) resist.…”
Section: Simulation Modelmentioning
confidence: 99%
“…The simulation works about thermal nanmimprint have been shown by researchers [5,6]. Fan et al have introduced a multi-scale approach for investigation of interfacial delamination , which links nanoscale and macroscale [7].…”
Section: Introductionmentioning
confidence: 99%