Computer-based management of interactive data transformation systems using Taguchi’s robust parameter design

Abstract

The Taguchi design method, which uses orthogonal arrays to study the quality of characteristics using only a small number of experiments, produces outstanding outcomes when applied to industrial processes. However, nearly all industrial data is concealed via interactive data transformations, for which Box-Cox, arcsine and logit with computer-based management are proposed. The efficiency of each transformation based on the mean and signal-to-noise ratio was investigated for a different number of replicates and noise levels on the response. A total of four simulated scenarios each with 100 noisy data sets were used to examine the system performance. The numerical results indicate that Box-Cox and arcsine transformations are superior to logit transformations. Moreover, the analytical outcomes from the interactive ranges of transformation parameters via the hybridisation of variable neighbourhood search and particle swarm optimisation methods were a close fit to the natural data. In an actual computer-based application of the interactive data transformation system for a ball swaging process, Box-Cox and arcsine transformations followed the simulated numerical data and provided much more appropriate outcomes closer to the natural data. The target of a gram load control was then met via process parameters with higher levels of ranking results of contribution ratio, as expected from the natural data.

Using the Taguchi-Genetic Algorithm to Improve Lithographic Photoresist Operating Conditions of Touch Panels to Upgrade After-Develop Inspection

“…This study's experiment measures the lithography BM negative photoresist build-up dimension on the OGS touch panel and uses the pattern hole size measurement data as a response value, i.e., the nominal-the-best characteristic, hoping to make the measured data meet the quality standard, in which the quality characteristic has a nominal-the-best characteristic [19]. The photoresist build-up dimension is taken as the target characteristic.…”