Modeling of Optical Thin Films 1988
DOI: 10.1117/12.941843
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Computer Simulation Of The Cross-Sectional Morphology Of Thin Films

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Cited by 18 publications
(3 citation statements)
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“…Typically, as a CTF is grown on a planar substrate mounted on a platform, the tops of the columns together constitute a surface that is almost planar. When the substrate has a slight undulation, possibly because of a dust particle or a manufacturing defect, that undulation, which is highly undesirable for most practical CTF applications in such fields as optics or microelectronics, is manifested at the top surface (4). Consequently, if a CTF were to be deposited on a fingermark, the top surface of the CTF would be expected to reproduce the topological details of the fingermark.…”
mentioning
confidence: 99%
“…Typically, as a CTF is grown on a planar substrate mounted on a platform, the tops of the columns together constitute a surface that is almost planar. When the substrate has a slight undulation, possibly because of a dust particle or a manufacturing defect, that undulation, which is highly undesirable for most practical CTF applications in such fields as optics or microelectronics, is manifested at the top surface (4). Consequently, if a CTF were to be deposited on a fingermark, the top surface of the CTF would be expected to reproduce the topological details of the fingermark.…”
mentioning
confidence: 99%
“…In contrast, the substrate is held stationary in traditional OAD methods employing thermal evaporation, electron-beam evaporation or sputtering. These traditional methods are able to replicate substrate nonplanarities, although the fidelity of replication begins to diminish as the thinfilm coating grows thicker [18]. As the film thickness is increased, any departure from planarity in the substrate creates a disturbance that increases in lateral extent with increasing thickness, the morphology of a growing thin film being governed by the evolution of power-law cones originating from small nucleation clusters or substrate nonplanarities (such as particles and indentations).…”
Section: Resultsmentioning
confidence: 99%
“…It is possible to model columnar growth in a completely mechanistic way -no assumptions about chemistry or crystallography (Yang et al, 1987). The model assumes that growth originates on seeds scattered randomly over the substrate.…”
Section: Columnar Aggregatesmentioning
confidence: 99%