Good control of the diffusion profile on Zn in GaAs is essential in many practical applications. By photoluminescence measurements the Zn distribution obtained in several diffusion runs at 850~ with GaZn:GaAs sources was determined. Under well-defined diffusion conditions, complementary error function distributions of the impurity were found. This is justified admitting that a nonequilibrium in gallium vacancy concentration may be noticeable for a relatively long time (up to 60-90 min); in this case the substitutionalinterstitial mechanisms are no longer valid and the diffusion becomes purely substitutional. The coefficient for substitutional diffusion is Ds : 1.5 X 10 -n cm 2 sec-L Complications due to the source composition and to the surface status of the substrate are also described.The Zn diffusion mechanism in GaAs can be well understood on Lhe basis of a substitutional-interstitial model (1) in which the equilibrium concentration of Ga vacancies is the controlling factor for the impurity diffusion. The diffusion is explained by means of the existence of a "fast" interstitial ion Zni m+ (m --1, 2 degree of ionization), which reacts with a gallium vacancy VGa to produce a "stationary" substitutional ion Zns-and (m -b 1) holes Zni m+ -}-VGa ---Zns--b (m + 1) e +[1]The amount of interstitial Zni depends on [VGa] and hence from the AS partial pressure PAs4 through the equilibrium constants K1 and Ks[Zni m + ] K1