Colloidal photolithography
is a versatile advanced technique for
fabricating periodic nanopatterned arrays, with patterns carved exclusively
on photoresist films deposited on solid substrates in a typical photolithographic
process. In this study, we apply colloidal photolithography to polystyrene
(PS) films half-covered with poly(methyl methacrylate) (PMMA) colloids
at the air–water interface and demonstrate that periodic hole
structures can be carved in PS films by two processes: photodecomposing
PS films with ultraviolet (UV) light and removing PMMA colloids with
a fluorinated solvent. Nonspherical holes, such as C-shaped and chiral
comma-shaped holes, are also fabricated by regulating the UV illumination
conditions. Furthermore, in addition to holes, convex patterns on
PS films are realized by combining weak UV illumination with solvent
treatment. We also demonstrate that actively using the water surface
as the UV illumination field enables periodic silver nanoparticle
spots to be deposited on PS films simply by dissolving silver ions
in the water phase.