Confinement in single walled carbon nanotubes investigated by spectroscopic ellipsometry

Battie, Yann; Jamon, Damien; Lauret, Jean‐sébastien; Gu, Qiang; Gicquel-Guézo, Maud; Naciri, A. En; Loiseau, Annick

doi:10.1016/j.tsf.2013.10.072

Cited by 5 publications

(1 citation statement)

References 16 publications

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“…SE has already been successfully implemented for investigations of twodimensional materials, including graphene 27,28 and transition metal dichalcogenides, 29,30 as well as films of noble metals 31,32 and SWCNTs. 14, 33 Battie et al 14,33 investigated rather thick and, as a result, opaque carbon nanotube films, whereas many applications, especially in transparent electronics, require thin films with low absorption in the visible wavelength range. Nevertheless, the application of SE for SWCNT thin films is a challenging task since standard ellipsometry analysis demands good initial guess of either the optical constants or the region of full transparency.…”

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confidence: 99%

Express determination of thickness and dielectric function of single-walled carbon nanotube films

Ermolaev

Tsapenko

Volkov

et al. 2020

Applied Physics Letters

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Single-walled carbon nanotube (SWCNT) films are promising building blocks for diversified applications in electronics, photovoltaics, and photonics. However, their electrical and optical engineering is still a challenging task owing to multiple obstacles, including the absence of fast and easy-to-use methods for the determination of SWCNT film properties. Here, we present a rapid, contactless, and universal technique for accurate estimation of both SWCNT film thicknesses and their dielectric functions. The approach combines broadband optical absorbance and highly sensitive spectroscopic ellipsometry measurements. The observed linear dependence of the film thickness on its absorbance at 550 nm provides a time-effective and contactless method of thickness assignment, which is of significant importance to the practical implementation of SWCNT films in optoelectronic devices. Additionally, our approach revealed that a simple procedure of film densification allows to controllably alter the dielectric response by at least 40% and, thus, to add extra fine-tuning capabilities during material property engineering. Therefore, this express technique as a whole offers an advanced metrological tool for current and next-generation SWCNT-based devices.

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