Conformal deposition of WSi<i>x</i> films on micron-sized trenches: The reactivity of film precursors

Saito, Takeyasu; Shimogaki, Yukihiro; Egashira, Yasuyuki; Komiyama, Hiroshi; Yuyama, Y.; Sugawara, Kazuharu

doi:10.1063/1.107791

Cited by 11 publications

(2 citation statements)

References 9 publications

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“…These criteria can also be satisfied by promoting the reactions of undecomposed precursors on the surface of trenches at low temperature and low pressure conditions, under which the sticking probability of the precursor is low. 20,21 For the conformal filling of high aspect ratio structures, an adequate and uniform supply of precursors over the surfaces can be achieved by increasing the precursor diffusion velocity and by supplying a large amount of precursor to the surface. To verify the discussed conformal coating mechanism by LPCVD, in Secs.…”

Section: A Mechanism Of Conformal Depositionmentioning

confidence: 99%

Conformal filling of silicon micropillar platform with b10oron

Deo

Brewer

Reinhardt

et al. 2008

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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A recently proposed micropillar semiconductor platform filled with a high volume of isotopic b10oron (B10) has great potential to yield efficient thermal neutron detectors because B10 has a high thermal neutron cross section. Here, the authors report the development of conformal filling of high aspect ratio silicon micropillar platforms with B10 by low pressure chemical vapor deposition (LPCVD) using B10-enriched decaborane (B10H14). The relationships between the pillar structure and the key process parameters including reaction temperature, process pressure, and buffer gas flow rates were investigated to optimize the conformal filling on these structures. Reaction temperature of 420–530 °C, process pressure of 50–450 mTorr, 0.3 SCCM (SCCM denotes cubic centimeter per minute at STP) B10H14 flow rate, and argon buffer gas flow rate of 0–200 SCCM were used to deposit B10 materials into the micropillar structures with aspect ratios of 3:1, 6:1, and 10:1. All three mentioned pillar structures were found to be completely (∼100%) filled with B10 at 420 °C and 50 mTorr. At higher process temperatures, the fill factors of the three pillar structures decreased significantly. The effect of reaction temperature, process pressure, and buffer gas flow rates on the LPCVD deposition mechanism with respect to the structure geometry are also discussed.

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Section: A Mechanism Of Conformal Depositionmentioning

confidence: 99%

Conformal filling of silicon micropillar platform with b10oron

Deo

Brewer

Reinhardt

et al. 2008

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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“…Low-pressure chemical vapor deposition (LPCVD) is an attractive process to produce conformal thin films because it has the ability to coat substrate topographies (high-aspect-ratio trenches) uniformly and conformally [12,18,19] unachievable by most line-of-sight deposition techniques [20,21] such as e-beam and thermal evaporation. Growth kinetics data for the pyrolysis of 10 B enriched CVD precursors in different reaction temperature zones is crucial to determine the deposition parameters to conformally coat high-aspect-ratio pillar substrates with 10 B films.…”

Section: Boron Depositionmentioning

confidence: 99%

Si pillar structured thermal neutron detectors: fabrication challenges and performance expectations

et al. 2011

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Solid-state thermal neutron detectors are desired to replace 3 He tube tube-based technology for the detection of special nuclear materials. 3He tubes have some issues with stability, sensitivity to microphonics and very recently, a shortage of 3 He. There are numerous solid-state approaches being investigated that utilize various architectures and material combinations. Our approach is based on the combination of high-aspect-ratio silicon PIN pillars, which are 2 µm wide with a 2 µm separation, arranged in a square matrix, and surrounded by 10 B, the neutron converter material. To date, our highest efficiency is ~ 20 % for a pillar height of 26 µm. An efficiency of greater than 50 % is predicted for our device, while maintaining high gamma rejection and low power operation once adequate device scaling is carried out. Estimated required pillar height to meet this goal is ~ 50 µm. The fabrication challenges related to 10 B deposition and etching as well as planarization of the three-dimensional structure is discussed.

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Microstructure Evolution and Process Control

2010

Engineering Materials and Processes

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Conformal deposition of WSix films on micron-sized trenches: The reactivity of film precursors

Cited by 11 publications

References 9 publications

Conformal filling of silicon micropillar platform with b10oron

Conformal filling of silicon micropillar platform with b10oron

Si pillar structured thermal neutron detectors: fabrication challenges and performance expectations

Microstructure Evolution and Process Control

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