Constant period line gratings as a metric for patterning fidelity in electron beam lithography
C. R. Fasano,
F. Cruz Aguirre,
C. T. DeRoo
et al.
Abstract:As smaller critical dimensions of devices fabricated via electron-beam lithography (EBL) are achieved over large areas, the need for new metrology techniques follows. Large (cm × cm) substrates have traditionally been both time and labor intensive to measure using traditional techniques such as scanning electron microscopy (SEM) or atomic force microscopy. When optimizing an EBL process over large areas, stitch error must be eliminated to maximize feature placement fidelity. Simultaneously, traditional EBL req… Show more
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