2010
DOI: 10.1007/s00339-010-6064-7
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Construction of conducting and photoconducting 3D structures with submicron resolution in electrooptical substrates

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Cited by 3 publications
(3 citation statements)
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“…This can be the basis for a selective etching technique that can be used for the construction of grooves, trenches with steep aspect ratio, and suspended structures for constructing devices cladded by air [13]. In addition, recent investigations of structures formed by the implantation of a high fluence of protons were shown these to be electrically conductive and photoconductive [19].…”
Section: Discussionmentioning
confidence: 99%
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“…This can be the basis for a selective etching technique that can be used for the construction of grooves, trenches with steep aspect ratio, and suspended structures for constructing devices cladded by air [13]. In addition, recent investigations of structures formed by the implantation of a high fluence of protons were shown these to be electrically conductive and photoconductive [19].…”
Section: Discussionmentioning
confidence: 99%
“…A pre-condition for achieving significant diffraction efficiency is a sufficient quantity of grating periods [23]. However, the absorption induced by the proton implantation [19] has limited the propagation distance in the waveguide. Therefore, an annealing process has been applied to the implanted crystal in order to diffuse the protons outside the active region.…”
Section: Fabricationmentioning
confidence: 99%
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