Construction of ion imprinted layer modified ZnFe2O4 for selective Cr(VI) reduction with simultaneous organic pollutants degradation based on different reaction channels

Continuous microwave synthesis of Bi2O3 rods coated with a temperature-sensitive polymer

“…9b, the calculated flat band potential over Bi 2 O 3 was -0.44 eV. It was well known that the CB of an n-type semiconductor had an energy higher than the flat band potential by 0-0.1 eV [50]. In our experiments, 0 eV was chosen as the voltage difference.…”

Molecularly imprinted photocatalysts: fabrication, application and challenges

“…44–47 Recently, some ternary oxide semiconductors, represented by AFe 2 O 4 types (A = Zn, Co, and Cu), have gotten much attention because of their excellent photochemical stability and rapid magnetic separation. 48–51…”

Preparation of efficient ion-imprinted polymers for selectively removing and detecting As(iii) from the aqueous phase

“…32,33 Compared with solid adsorbents, mesoporous adsorbents possess many advantages, such as low surface tension, large specific surface areas, small viscosity temperature coefficients, high compressibility and high gas permeability. 34 For example, Fan He et al 35 implemented the fabrication of uniformly distributed mesoporous ion-imprinted ZnFe 2 O 4 via ion imprinting technology with microwave assistance so as to efficiently remove chromium(VI) ions; the results of adsorption experiments showed that its maximum adsorption capacity was 150.43 mg g À1 in the dark, which was approximately 1.71 times that of non-mesoporous imprinted polymers. Moreover, bifunctional monomer technology also can effectively improve adsorption capacities due to its many advantages, including mild reaction conditions, easy preparation of porous adsorbents with a high cross-linking degree, and good thermal and chemical stability.…”